customized optical sensor for r2r - nov 2014

Customized Optical Sensors for

Roll-to-Roll Manufacturing

November 2014

Gang Sun, Ph.DSunOptical Systems, LLC

Email: [email protected]: 908-799-8886, Fax: 908-509-0711

SunOptical Systems, November 2014 2

Overview

�Provide high-speed inline inspection sensors for roll-to-roll manufacturing and research needs.

�Macro inspection (5 to 20µm resolution) for large area at high-speed for continous moving targets

�Realtime inspection synchronized with roller encoder inputs to have accurate position stamps

�Customized illumiation configurations optimized for different applications

�Sensor array can provide full area coverage, with independent sensor-level defects identification and ethernet-connected data storage and analysis.


Installations at CAMM Endicott, NY


Speed benefit of a profile sensor

� Traditional vision sensor read in all pixels with full information but requires N×N amount of data transfer

� Projection profiles are the sum of the pixels in columns and rows, which subtracts the shape and position while

requires only 2N amount of data transfer.

4

image sensor projection profiles

x - profile

y -

pro

file


Defects inspection

�Surface particles - size, count, statistics�Oblique light scattering provides strong signals

for micon or sub-micron particles identification

�Modeling polarized light scattering on transparent substrate provides quantitative measurements

�Surface scratch - length, width, intensity�Shape-based algorithms can effectively identify

and measure scratches of micron-level

�Scratch depth can be estimated from polarized light scattering analysis

�For substrate as well as for patterned structrues, such as sensitive sensor pads


Test with a glass defects standard

Scrach: 10µm width, 400nm height,

with AFM measurement Kodak Surface Quality Reference,

Edmund Optics #53-197

AFM image and measurement


Pattern inspection

� Pattern matching and

registration

� Dimension and position measurements

� Low-contast patterns can be enhanced with polarizers in

illumination and imaging

together

� Selective edge signal

enhancement depends on

applications need

Courtesy of a CAMM sample


Line edge quality

� Light scattering from edge is

polarization dependent and

correlates to its height, slope and roughness

� Some pattern print errors can be quickly identified at edge under

certain polarizer configations in

illumination and imaging

� Combine results from multiple

polarization configurations can

provide more information

good die

bad die

null configuration

null configuration



Film inspection

� Difference in contrast and

color indicates difference in film thickness or

refractive index

� Large area inline color

inspection measures film uniformity in realtime

� Polarization-dependent changes in color and

intensity can provide

measurements for

anisotropic films

300nm ITO film with one Oxygen concentration

300nm ITO film with a different Oxygen concentration

low contrast polarization configuration high contrast polarization configuration

low contrast polarization configuration high contrast polarization configuration



Sensors array for large-area inspection

� To measure large area at high-speed, array of the same

sensors can be connected

� Different measurements are carried out by different

sensor arrays in parallel for the same moving sample

� Each sensor provides low-level defects identification

� Combined measurement results are analyzed to make the process decision

10

Ethernet connected sensors array for high-speed


�Defects identification and classification algorithms

development - Timothy Moon

�Timing generation with FPGA based on roller postion encoder - Robert Hogan

�Pattern position & dimension measurement, pattern

errors identification - Kenji Okamoto

�CAMM applications and systems support - Robert

Malay & Joseph Steiner

�Sensors supplier with inspection & metrology

technology support - SunOptical Systems

�Director - Mark Poliks

Current CAMM inspection team


� Rudolph Technologies, http://www.rudolphtech.com, 2004 - 2013� Sr. Technologist, optical systems design for thin-film metrology

� WaferView Inspection Tool Owner and Products Development Manager, for semiconductor lithography and defects inspection

� Nanometrics, http://nanometrics.com, 2002 - 2004� Sr. Systems Scientist, developed data acquisition and system

calibration for a new spectroscopic ellipsometer design

� Therma-Wave, http://www.thermawave.com, 2000 - 2002� Sr. Research Scientist, designed & prototyped integrated DUV

reflectrometer, confocal autofocusing, dual-mag pattern-rec imaging

� Ford Research, http://corporate.ford.com/innovation, 1998 - 2000� Research Assistant, developed a metal corrosion inspection system

� Rutgers Business School, MBA

� Wayne State University, PhD in Physics

Gang's Previous experience

customized optical sensor for r2r - nov 2014

Documents

d sunoptical systems

film inspection difference

pattern inspection pattern

macro inspection

nm ito film

film thickness

polarization dependent

roll manufacturing