csir - immt _ 3
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12/24/2014 CSIR - IMMT | Institute of Minerals and Materials Technology Bhubaneswar, Odisha
http://www.immt.res.in/Facilitiesamt.aspx?Did=7
CSIR - IMMTInstitute of Minerals and Materials Technology
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Advanced materials Technology Facilities
Cryomill with integrated cooling system (Make: Retsch GmbH, Germany). For size
reduction, mixing and homogenization. Efficient cryogenic grinding at -196C
Dilatometer, (Make: LINSEIS, Germany. Model: L75HS1600) Horizontal push rod
type, max. temp: 1600C
Spectroscopic Ellipsometer (Horiba make) for thin film thickness and optical
constants measurements.
Vacuum furnace (Make: M/s. M.S. Enterprises, Hyderabad). Max. Temp: 1100C;
Continuous operating temp: 1000C, Vacuum: 10-5 mbar
DLS based Nano particle analyzer (Measuring size range of 0.3nm to 5000nm)
Nanoindentation system (Make: Fisher-Cripps, Australia) Maximum load 500 mN.
Atomic Force Microscope (AFM), (Make: DME, Denmark), scan area of 200 x 200
m2.
DC extended arc plasma reactor for coating of diamond on SiC (75 kW)
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12/24/2014 CSIR - IMMT | Institute of Minerals and Materials Technology Bhubaneswar, Odisha
http://www.immt.res.in/Facilitiesamt.aspx?Did=7
DC plasma reactor for production of nano powder (35kW)
Static bed plasma reactor (50kW, DC)
Moving bed plasma reactor for metalised ilmenite processing(50 kW)
In-flight plasma reactor for ilmenite processing (50 kW)
Jet-wheel impact atomizer based spray dryer for spheroidized grain alumina powder
production (Pilot plant, 26 kW)
Vacuum induction melting furnace (15kW, 10kHz)
Microwave sintering furnace (6kW)
Microwave hydrogen plasma reactor (6kW)
Pulse laser deposition unit (248 nm KrF excimer laser)
Dual drive planetary ball mill with gas purging facility ( kg scale processing)
Planetary ball mill with gas and temperature monitoring attachment (gram scale
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12/24/2014 CSIR - IMMT | Institute of Minerals and Materials Technology Bhubaneswar, Odisha
http://www.immt.res.in/Facilitiesamt.aspx?Did=7
Quick Links
OneCSIR (ERPS)Knowledge CenterLinksNews and EventsPublicationIntranet Services (LAN Users)
processing)
Microwave plasma CVD system for diamond film growth.(3 kW, 2.45 GHz, Saki
technotron, Japam)
Dual cathode DC/RF sputtering system for film deposition (750 W DC, 300 W
RF)AJA International , USA
Pulse DC sputtering system
STR 500 Raman system 5/4 nm , 488nm(Seki, Japan)
Contact angle measurement system (Seo, South korea)
High vacuum quartz tube furnace furnace (1200 C )
Plasma reactor for powder processing (Pilot plant)
Hydrogen plasma smelting reactor for green steel production (50kW)
CSIR- Institute of Minerals and Materials Technology( Formerly Regional Research Laboratory)Council of Scientific & Industrial ResearchBhubaneswar - 751 013, Odisha, INDIAFAX: 91-674-2567160Telephone : +91-674-2567126, +91-674-237-9401 2012 - All Rights Reserved
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