comparisons of dft-md, tb- md and classical md ... · comparisons of dft-md, tb-md and classical md...
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Comparisons of DFT-MD, TB-MD and classical MD calculations of radiation damage and plasma-wallinteractions
Kai Nordlund
Department of Physics and Helsinki Institute of Physics
University of Helsinki, Finland
Kai Nordlund, Department of Physics, University of Helsinki 2
Contents
0. Levels of molecular dynamics
1. Examples of comparisons of classical and
quantum mechanical methods
- Si: threshold displacement energy:
DFT-MD vs. classical
- Erosion and sticking of hydrocarbons in
fusion reactors:
TB-MD vs. classical
Kai Nordlund, Department of Physics, University of Helsinki 3
0. Levels of molecular dynamics
By increasing order of realism: Coarse-grained MD
- Multimillions of objects
- Now popular in biophysics
Classical (analytical potential) MD
- Hundreds of millions of atoms
- Dominating by scopes of use
Tight-binding MD
- ~ A few hundred atoms
- Has been used for some 20 years
Density-functional theory MD
- ~ One hundred atoms
- Use widely increasing now
Time-dependent density functional
theory MD
- ~ A few tens of atoms
- Practical uses limited so far
“True” Hartree-Fock ab initio
- ~ A few tens of atoms
- Practical uses limited so far
Relevant for
sputtering
simulations
But because
of need for
statistics,
classical still
dominates!
- Although
ideally
everything
better be done
by DFT MD…
Kai Nordlund, Department of Physics, University of Helsinki 4
Threshold displacement energy in Si
- Introduction
The threshold displacement energy
is the smallest amount of kinetic
energy needed to permanently
displace an atom from its lattice site
to an interstitial position
A vacancy is left behind so a Frenkel pair is produced
Mathematically, where p is the probability for displacement,
(α,φ) is the direction of recoils in spherical coordinates, T is
the energy of the recoil, and Td (α,φ) is the threshold energy
surface in 3D:
Typically Td ~ 10 - 50 eV
Kai Nordlund, Department of Physics, University of Helsinki 5
Threshold displacement energy in Si
- Introduction
Minimum vs. average threshold displacement energy:
Direction-specific
thresholds: Td,100, Td,110, …
Average threshold
displacement energy:
Minimum threshold
displacement energy:
- Usually in one of principal directions
<100>
<111>:
B Open
A Closed
<110>
AVERAGE
,min min ( , )d dT T
,ave ave ( , )d dT T
Kai Nordlund, Department of Physics, University of Helsinki 6
Threshold displacement energy in Si
Introduction: why?
Why does Td matter?
It is the single most important quantity in determining
radiation damage in solids
It determines directly the number of Frenkel pairs created
NFP by high-energy electron irradiation
It is also used to estimate the damage caused by neutron
and ion irradiation via the Kinchin-Pease/NRT equation:
From here also the “displacement-per-atom” (dpa) value is
obtained
It is the threshold for vacancy production in TRIM/SRIM
,
Nuclear deposited energy0.8
2FP
d ave
NT
Kai Nordlund, Department of Physics, University of Helsinki 7
Threshold displacement energy in Si
Introduction
Why study Td in silicon?
Silicon is the foundation for
the semiconductor industry,
where ion implantation is the most
commonly used doping method
Silicon appears in many other
applications, where radiation
is omnipresent (radiation
detectors, sensors, etc.)
In spite of this, Td is poorly known
There is even confusion
between the minimum and
average of Td
Kai Nordlund, Department of Physics, University of Helsinki 8
Threshold displacement energy in Si
Introduction
Why use molecular dynamics (MD) to study Td?
The threshold displacement energy is difficult to determine
experimentally: The experimental methods, which
practically all rely on electron irradiation, cause problems in
interpreting the results (spreading of the beam, isolated
defects vs. clustered defects, annealing of damage etc.)
MD (=simulation of atom motion) can determine it directly
without these problems
Why use Density Functional Theory (DFT) to study Td?
The choice of classical MD potentials is a source of
considerable deviation in the results – values range around
10 – 23 eV
DFT is a quantum mechanical, more basic level of theory
Kai Nordlund, Department of Physics, University of Helsinki 9
Threshold displacement energy in Si
Simulation methodology
DFT MD is veeery slow
Hence we took a 4-step approach:
1. Use classical MD in very large systems (thousands of
atoms) for long times (~ 10 ps) to find a reliable value
within the model used:
Two widely different potentials: Stillinger-Weber and Tersoff
2. Scale down the system size and simulation time in the
classical as much as possible while checking that the result
does not change too much in either model
3. Find minimal basis set in DFT which keeps point defect
energies ~ unchanged
4. Use DFT MD with the minimal system size and basis set to
get a more reliable value of Td
Kai Nordlund, Department of Physics, University of Helsinki 10
Threshold displacement energy in Si
Simulation methodology
Choose a random direction (α,φ), set E = E0 (8 eV)
Simulate a recoil in the direction (α,φ) with energy E
Frenkel pair formed?
E = E + ΔE
NO
Threshold energy in the direction (α,φ) found
YES
Kai Nordlund, Department of Physics, University of Helsinki 11
Threshold displacement energy in Si
Simulation methodology: scaling results
Results of the classical
scaling tests:
Natoms
has to be > 100
We chose 144 atom
periodic non-cubic cell
Simulation time was
similarly optimized
Time has to be >= 3 ps
We chose 3 ps
Kai Nordlund, Department of Physics, University of Helsinki 12
Threshold displacement energy in Si
II. Simulation methodology:
DFT Parameter Scanning
The general parameters of the
dynamical simulation were now
optimized
The next step was to optimize
the DFT parameters
The goal was to find one suitable
LDA set and one suitable GGA set
Criteria for a suitable set:
Reasonable calculation time (a few days per recoil simulation)
Good energetics for the basic point defects
The DFT code we used was SIESTA
Final sets:
LDA: SZ, 4 k points, 100 Ry cutoff, Ceperley-Alder
GGA: SZ, 4 k points, 250 Ry cutoff, Perdew-Burke-Ernzerhof
Kai Nordlund, Department of Physics, University of Helsinki 13
Threshold displacement energy in Si
Results
Formation of close FP in closed 111 direction:
Kai Nordlund, Department of Physics, University of Helsinki 14
Threshold displacement energy in Si
Results
Recombination effects are major:
110 direction, 20 eV
Kai Nordlund, Department of Physics, University of Helsinki 15
Threshold displacement energy in Si
The DFT simulations
Our goal was to find the average
threshold displacement energy
of silicon within a statistical
error limit of 2 eV
The average threshold energy in
the LDA scheme
40 random directions for A
40 random directions for B
The GGA scheme was used to
confirm the average obtained by
LDA
10 random directions for A
10 random directions for B
112 direction, 20 eV
111 direction, 20 eV
Kai Nordlund, Department of Physics, University of Helsinki 17
Threshold displacement energy in Si
The DFT simulations: Results
Two surprising effects were observed:
A large fraction of defects
formed were IV pairs
(= Bond Defects, BD)
These usually formed at
lower E‟s than Frenkel pairs
Big difference to classical MD
Majority of „real‟ Frenkel pairs
contained a tetrahedral rather
than a dumbbell interstitial
Explanation: Frenkel pair
with tetrahedral interstitial
lower in E
Kai Nordlund, Department of Physics, University of Helsinki 18
Threshold displacement energy in Si
The DFT simulations: Results
Results for minimum threshold:
DFT: Td, min = 12.5 ± 1.5SYST eV, open 111 direction
Experiment: Td, min = 12.9 ± 0.6 eV, 111 direction
Excellent agreement!
This gave us great confidence that we can reliably predict
the average threshold displacement energy
Results for average threshold:
Counting IV pair or Frenkel pairs:
- LDA DFT: Td, ave = 24 ± 1STAT
± 2SYST
eV
- GGA DFT: Td, ave = 23 ± 2STAT
± 2SYST
eV
Counting only Frenkel pairs:
- LDA DFT: Td, ave = 36 ± 2STAT
± 2SYST
eV
- GGA DFT: Td, ave = 35 ± 4STAT
± 2SYST
eV
[Loferski and Rappaport, Phys. Rev. 111 (1958) 432]
Kai Nordlund, Department of Physics, University of Helsinki 19
Threshold displacement energy in Si
How good are the classical models?
We also compared the classical potentials systematically
with the quantum mechanical ones
=> Stillinger-Weber (SW) does best of the classical
potentials
[E. Holmström et al, Phys. Rev. B 78, 045202 (2008)]
Kai Nordlund, Department of Physics, University of Helsinki 20
Threshold displacement energy in Si
3D displacement energy surface
The classical models have sufficient statistics that we can
plot the full 3D displacement energy surface Td (α,φ)
Minimum in all around open 111 direction
Maximum in all around <144> directions
(~ 45o off closed 111)
A bit below straight impact to
2nd-nearest neighbor from A
Kai Nordlund, Department of Physics, University of Helsinki 21
Threshold displacement energy in Si
Conclusions
There are considerable differences between DFTMD and
classical MD results of the threshold displacement energy
in Si
Even qualitative: the large production of Bond Defects is not
reproduced by any of the classical potentials
Even so, classical MD can help DFT-MD:
Use first classical MD to determine acceptable system size
and simulation conditions for DFT!
[E. Holmström et al, Phys. Rev. B 78, 045202 (2008)]
Kai Nordlund, Department of Physics, University of Helsinki 22
And now…
Let's switch gears…
Kai Nordlund, Department of Physics, University of Helsinki 23
Erosion of carbon in fusion reactors
Erosion of hydrocarbons: classical vs. TB
In 1999-2001 we
showed that the
athermal part of
the carbon
erosion can be
explained by the
swift chemical
sputtering
mechanism
Athermal, rapid,
endothermal
[Salonen et al, Europhys. Lett. 52 (2000)
504; Phys. Rev. B 63 (2001) 195415]
Kai Nordlund, Department of Physics, University of Helsinki 24
Erosion of carbon in fusion reactors
Comparison of classical vs TB MD
Results of
comparison:
Exactly same
simulation cell,
about 200 atoms
Relaxed in each
model before
bombardments
Kai Nordlund, Department of Physics, University of Helsinki 25
Sticking of radicals on dangling bonds
Introduction: Radicals in the reactor
The MD simulations show both CHx and C2Hy erosion
As well as larger hydrocarbons
Fraction depends on surface structure and ion energy
Experiments show that ”CH3 and C2H2 are the most
abundantly sputtered species from plasma-facing carbon
materials in fusion devices”
[E Vietzke and A. A. Haasz, in Physical Processes of the Inaction of Fusion Plasmas with Solids, Chap. 4 (1996)]
Kai Nordlund, Department of Physics, University of Helsinki 26
Sticking of radicals on dangling bonds
Methods
We have carried out simulations of radical sticking
We have limited ourselves to model surfaces with a well-
defined dangling bond nature (or lack of it)
Classical:
Brenner (1st generation) potential with bond conjugation
terms
- But cutoff extended to 2.46 Å (this reproduces better the
diamond-to-graphite phase transition [Nordlund et al, PRL
77, 699 (1996)] )
Tight-binding:
Density-functional based tight-binding model of Frauenheim
et al.
Implemented into our own code as force model
Kai Nordlund, Department of Physics, University of Helsinki 27
Sticking of radicals on dangling bonds
Sticking of CH3: dependence on db
neighbourhood
7 DB: sticking cross section =
average area per surface site,
5.9 Å2
Kai Nordlund, Department of Physics, University of Helsinki 28
Sticking of radicals on dangling bonds
Sticking of CH3: angular dependence
We find a major dependence of the sticking probability
vs. distance from unsaturated carbon site at different
angles of incidence of CH3
angles of incidence
[Träskelin et al, J. Appl. Phys. 93, 1826 (2003)]
Kai Nordlund, Department of Physics, University of Helsinki 29
Sticking of radicals on dangling bonds
Sticking of CH3: animation of TB case
Kai Nordlund, Department of Physics, University of Helsinki 30
Sticking of radicals on dangling bonds
Sticking of CH3: model dependence
There is a model dependence between the TB and
classical results
TB likely to be more reliable
[Träskelin et al, J. Nucl. Mater. 334, 65 (2004).)]
Kai Nordlund, Department of Physics, University of Helsinki 31
Sticking of radicals on dangling bonds
Sticking of CH3: comparison to experiments
and analytical model
The TB results are in excellent agreement with
experiments
Angular dependence can be explained by a simple
analytical model
[Träskelin et al, J. Nucl. Mater. 334, 65 (2004).)]
Kai Nordlund, Department of Physics, University of Helsinki 32
Sticking of radicals on dangling bonds
Sticking of C2Hx
We have also studied the sticking of C2Hx molecules on
similar model surfaces
Incoming molecule equilibrated at 300 or 2100 K
Surface at 0 K initially
Kai Nordlund, Department of Physics, University of Helsinki 33
Sticking of radicals on dangling bonds
Animation...
C2H2 on 7db
surface
Kai Nordlund, Department of Physics, University of Helsinki 34
Sticking of radicals on dangling bonds
Results at 300 K, 1db surface
Sticking
probability
decreases with
increasing
amount of H
atoms
Not surprising
at all => more
H makes them
less chemically
reactive
[Träskelin, J. Nucl. Mater. 375, 270 (2008)].
Kai Nordlund, Department of Physics, University of Helsinki 35
Sticking of radicals on dangling bonds
Results at 2100 K, 1db surface
[Träskelin, J. Nucl. Mater. 375, 270 (2008)].
Kai Nordlund, Department of Physics, University of Helsinki 36
Sticking of radicals on dangling bonds
Comparison of results with amount of H
What is very
interesting is that
the sticking
cross section is
non-monotonous
with x in C2Hx
Reason: basic
chemistry: odd x
are radicals,
even x not!
x = Number of H atoms
Sti
ckin
g c
ross
sec
tion
(Å
)
[Träskelin, J. Nucl. Mater. 375, 270 (2008)].
Kai Nordlund, Department of Physics, University of Helsinki 37
Sticking of radicals on dangling bonds
New results: DFT MD of hexane on Si
C6H14 deposition on
Si (100) surface
No sticking because of
no dangling bonds in
molecule
Kai Nordlund, Department of Physics, University of Helsinki 38
Sticking of radicals on dangling bonds
Conclusions
Our results show that hydrocarbon sticking on dangling
bonds in carbon-based materials is:
Not so sensitive to the incoming molecule temperature
Somewhat sensitive to the simulation model used
Very sensitive to the dangling bond neighbourhood
Very sensitive to the incoming angle
Very sensitive to the number of hydrogens in the molecule
Kai Nordlund, Department of Physics, University of Helsinki 39
Conclusions
- Overall conclusions
Classical interatomic potentials can easily have
systematic errors
DFT-MD starts to be of practical value now w.r.t. sticking
and reflection calculations
But will remain out of reach for larger systems for years
DFT checks and calibrations of classical MD a good way to
assess their reliability