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Characterization of KETEK SiPMs – ICASiPM 2018 1 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann ([email protected]) KETEK SiPM

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Page 1: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018 1

SiPM

Characterization of SiPMs for Large Scale Applications

Eugen Engelmann ([email protected])

KETEK SiPM

Page 2: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018 2

SiPM KETEK

• Family-owned enterprise, founded in 1989 by Dr. Josef Kemmer

• Number of employees: 100

• Certified according to ISO9001:2015

• Major product lines:

- SDD modules, detector electronics and complete systems

- Silicon Photo Multipliers (SiPMs) since 2007

Page 3: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

KETEK SiPM

3

• Performance of new WB-Series

• superior ratio of PDE to micro-cell pitch

(up to 50 % at 420 nm)

• superior DQE

(S. Vinogradov, talk given at LIGHT-2014)

• low dark count rate

(< 100 kHz/mm²)

• state of the art SPTR

(down to 150 ps FWHM)

• highly robust and MSL1 approved package

Page 4: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

KETEK SiPM

4

• Performance of new WB-Series

• superior ratio of PDE to micro-cell pitch

(up to 50 % at 420 nm)

• superior DQE

(S. Vinogradov, talk given at LIGHT-2014)

• low dark count rate

(< 100 kHz/mm²)

• state of the art SPTR

(down to 150 ps FWHM)

• highly robust and MSL1 approved package

• Objectives of current research

• further suppression of noise parameters

• combination of high dynamic range and high

PDE

• improve PDE for NIR light

Page 5: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

KETEK SiPM

5

• Performance of new WB-Series

• superior ratio of PDE to micro-cell pitch

(up to 50 % at 420 nm)

• superior DQE

(S. Vinogradov, talk given at LIGHT-2014)

• low dark count rate

(< 100 kHz/mm²)

• state of the art SPTR

(down to 150 ps FWHM)

• highly robust and MSL1 approved package

• Objectives of current research

• further suppression of noise parameters

• combination of high dynamic range and high

PDE

• improve PDE for NIR light

Visit www.ketek.net/sipm for more information

Page 6: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Production chain of the KETEK SiPM

6

SiPM Fabrication at CMOS Foundry • ISO/TS 16949:2009 resp. IATF 16949:2016

(Quality Systems for Automotive Suppliers)

Page 7: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Production chain of the KETEK SiPM

7

SiPM Fabrication at CMOS Foundry • ISO/TS 16949:2009 resp. IATF 16949:2016

(Quality Systems for Automotive Suppliers)

Wafer Level Scale Packaging • ISO/TS 16949:2009

(Quality Systems for Automotive Suppliers)

IV screening of wafers

Page 8: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Production chain of the KETEK SiPM

8

SiPM Fabrication at CMOS Foundry • ISO/TS 16949:2009 resp. IATF 16949:2016

(Quality Systems for Automotive Suppliers)

Wafer Level Scale Packaging • ISO/TS 16949:2009

(Quality Systems for Automotive Suppliers)

Batch Qualification

PDE, DCR, CTP, AP, SPTR, TTD, Recovery, Gain

about 50 pcs

IV screening of wafers

Page 9: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Production chain of the KETEK SiPM

9

SiPM Fabrication at CMOS Foundry • ISO/TS 16949:2009 resp. IATF 16949:2016

(Quality Systems for Automotive Suppliers)

Wafer Level Scale Packaging • ISO/TS 16949:2009

(Quality Systems for Automotive Suppliers)

Batch Qualification

PDE, DCR, CTP, AP, SPTR, TTD, Recovery, Gain

about 50 pcs

• Standard techniques:

• PDE (photo detection efficiency)

• SPTR (single photon time resolution)

• DCR (dark count rate)

• Recovery time and gain

• Advanced techniques:

• correlated noise

• spatially resolved DCR

IV screening of wafers

Page 10: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018 10

KETEK PDE-Setup

pulsed light

source Diffuser

55 cm

SiPM

Amp.

SiPM

PIN Voltmeter

TIA

Dark Box

Sync. out

PSI DRS4 v5

Optical Fiber

Amp.

• simultaneous meas. of two SiPMs

• automatic DAQ and analysis

• PIN-diode as reference for incident light

• commonly used approach:

• P. Eckert et al., doi: 10.1016/j.nima.2010.03.169

A. Otte et al., doi: 10.1016/j.nima.2016.09.053 Nincident via ref. SiPM

or PIN-diode

Page 11: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018 11

• superior ratio of PDE to µ-cell pitch

for blue light

• trade off: PDE vs. dynamic range

PDE

Page 12: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018 12

• superior ratio of PDE to µ-cell pitch

for blue light

• trade off: PDE vs. dynamic range

PDE

Our goal: PM3325 with fill factor comparable to PM3350

Page 13: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

KETEK SPTR Setup

13

Bias Ch1

Diode Laser HPK PLP-10 C10196

with 406nm and 60ps pulse width (FWHM) Optical Fiber Thorlabs M31L01

Free-space Attenuator

Optical Fiber Thorlabs M31L01

Dist min. 10-15 cm

Wideband Amplifier Phillips Scientific 6955 20-700 MHz G=10

KETEK Evaluation Kit 0.1-1000 MHz G=13 Impedance matching to 50 Ohm input with reference transformer

sync out

PSI DRS4 v5 BW 700 MHz 14-bit ADC 5 GS/s

Page 14: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

SPTR

14

• only 1 p.e. pulses are considered

• LE-threshold at ≈0.35 p.e.

• linear interpolation between samples

to increase accuracy

• correction for baseline fluctuation

Page 15: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

SPTR

15

• only 1 p.e. pulses are considered

• LE-threshold at ≈0.35 p.e.

• linear interpolation between samples

to increase accuracy

• correction for baseline fluctuation

Page 16: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

SPTR

16

• only 1 p.e. pulses are considered

• LE-threshold at ≈0.35 p.e.

• linear interpolation between samples

to increase accuracy

• correction for baseline fluctuation

SPTR≈148 ps

Page 17: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018 17

KETEK DCR-Setup

SiPM 1 Amp.

Dark Box

PSI DRS4 v5

SiPM 2

SiPM 3

SiPM 4 Amp.

Amp.

Amp.

• automatic DAQ

(4 samples simultaneously)

• acquisition of randomly triggered WFs

• pulse detection via WF-analysis

• LED with threshold set at 0.5 p.e.

• DCR is number of pulses per

investigated signal time

Page 18: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018 18

KETEK DCR-Setup

SiPM 1 Amp.

Dark Box

PSI DRS4 v5

SiPM 2

SiPM 3

SiPM 4 Amp.

Amp.

Amp.

• automatic DAQ

(4 samples simultaneously)

• acquisition of randomly triggered WFs

• pulse detection via WF-analysis

• LED with threshold set at 0.5 p.e.

• DCR is number of pulses per

investigated signal time

DCR via pulse counting is only applicable due to low afterpulsing

and delayed X-talk

Page 19: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018 19

KETEK DCR-Setup

SiPM 1 Amp.

Dark Box

PSI DRS4 v5

SiPM 2

SiPM 3

SiPM 4 Amp.

Amp.

Amp.

• automatic DAQ

(4 samples simultaneously)

• acquisition of randomly triggered WFs

• pulse detection via WF-analysis

• LED with threshold set at 0.5 p.e.

• DCR is number of pulses per

investigated signal time

DCR via pulse counting is only applicable due to low afterpulsing

and delayed X-talk

Visit my talk on Wed at 14:40 for more details

Page 20: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

DCR

20

< 100 kHz/mm²

• modification of µ-cell for new WB-series

• suppression of diffusion current

• significant reduction of DCR below

100 kHz/mm2 at T=21 °C and saturated PDE

Page 21: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

DCR

21

< 100 kHz/mm²

fast decrease with T

• modification of µ-cell for new WB-series

• suppression of diffusion current

• significant reduction of DCR below

100 kHz/mm2 at T=21 °C and saturated PDE

• no impact on DCR at lower temperatures

Page 22: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Spatially Resolved DCR

22

• µ-cells emit light during breakdown

• ~2.6·10-5 photons/electron in spectral range

from 500 – 1600 nm (R. Mirzoyan et al., doi:10.1016/j.nima.2009.05.081)

• detection of emitted light with CCD camera

• light intensity is proportional to DCR

Page 23: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Spatially Resolved DCR

23

• µ-cells emit light during breakdown

• ~2.6·10-5 photons/electron in spectral range

from 500 – 1600 nm (R. Mirzoyan et al., doi:10.1016/j.nima.2009.05.081)

• detection of emitted light with CCD camera

• light intensity is proportional to DCR

spatially resolved DCR

Page 24: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Spatially Resolved DCR

24

• µ-cells emit light during breakdown

• ~2.6·10-5 photons/electron in spectral range

from 500 – 1600 nm (R. Mirzoyan et al., doi:10.1016/j.nima.2009.05.081)

• detection of emitted light with CCD camera

• light intensity is proportional to DCR

• non-destructive method for defect analysis (presented at IEEE NSS/MIC/RTSD 2016 and NDIP 2017)

• homogeneous emission from majority of µ-cells

• enhanced emission from hotspots in single µ-cells

spatially resolved DCR

Page 25: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Spatially Resolved DCR

25

• µ-cells emit light during breakdown

• ~2.6·10-5 photons/electron in spectral range

from 500 – 1600 nm (R. Mirzoyan et al., doi:10.1016/j.nima.2009.05.081)

• detection of emitted light with CCD camera

• light intensity is proportional to DCR

• non-destructive method for defect analysis (presented at IEEE NSS/MIC/RTSD 2016 and NDIP 2017)

• homogeneous emission from majority of µ-cells

• enhanced emission from hotspots in single µ-cells

hotspots are responsible for ≈55 % of the total DCR

spatially resolved DCR

Page 26: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Spatially Resolved DCR

26

• variation of fabrication process

• reduction of crystal defects in aval. zone

• significant reduction of hotspots in

prototype SiPMs

PM3350-WB

PM3350-Prototype

suppression of hotspots

Page 27: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Spatially Resolved DCR

27

• variation of fabrication process

• reduction of crystal defects in aval. zone

• significant reduction of hotspots in prototype SiPMs

• further suppression of DCR below 50 kHz/mm2

• goal in SiPM development: DCR< 10 kHz/mm2

< 50 kHz/mm²

PM3350-WB

PM3350-Prototype

suppression of hotspots

Page 28: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Probability of Correlated Pulses (PCP)

28

• measure Δt between pulses

• use CCDF method to extract PCP

(S. Vinogradov,

doi:10.1109/NSSMIC.2016.8069965)

• CCDF and pulse counting show same DCR

• reason is the low afterpulsing and

delayed X-talk probability

Page 29: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Probability of Correlated Pulses (PCP)

29

• measure Δt between pulses

• use CCDF method to extract PCP

(S. Vinogradov,

doi:10.1109/NSSMIC.2016.8069965)

• CCDF and pulse counting show same DCR

• reason is the low afterpulsing and

delayed X-talk probability

Page 30: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Probability of Correlated Pulses (PCP)

30

• measure Δt between pulses

• use CCDF method to extract PCP

(S. Vinogradov,

doi:10.1109/NSSMIC.2016.8069965)

• CCDF and pulse counting show same DCR

• reason is the low afterpulsing and

delayed X-talk probability

• PCP increases with decreasing threshold

• afterpulsing and delayed X-talk are not

distinguished PCP ≈ 1%

Page 31: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Probability of Correlated Pulses (PCP)

31

• measure Δt between pulses

• use CCDF method to extract PCP

(S. Vinogradov,

doi:10.1109/NSSMIC.2016.8069965)

• CCDF and pulse counting show same DCR

• reason is the low afterpulsing and

delayed X-talk probability

• PCP increases with lower threshold

• afterpulsing and delayed X-talk are not

distinguished PCP ≈ 1%

Visit my talk on Wed at 14:40 for more details

Page 32: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Production chain of the KETEK SiPM

32

SiPM Fabrication at CMOS Foundry • ISO/TS 16949:2009 resp. IATF 16949:2016

(Quality Systems for Automotive Suppliers)

Wafer Level Scale Packaging • ISO/TS 16949:2009

(Quality Systems for Automotive Suppliers)

Batch Qualification

DCR, CTP, AP, PDE, TTDS, SPTR, Recovery, Gain

IV screening of wafers

Page 33: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Production chain of the KETEK SiPM

33

SiPM Fabrication at CMOS Foundry • ISO/TS 16949:2009 resp. IATF 16949:2016

(Quality Systems for Automotive Suppliers)

Wafer Level Scale Packaging • ISO/TS 16949:2009

(Quality Systems for Automotive Suppliers)

Batch Qualification

DCR, CTP, AP, PDE, TTDS, SPTR, Recovery, Gain

Reliability Testing

H³TS: 15pcs HTS: 15pcs

MSL1: 45pcs

TC: 15pcs

IV screening of wafers

Page 34: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Production chain of the KETEK SiPM

34

SiPM Fabrication at CMOS Foundry • ISO/TS 16949:2009 resp. IATF 16949:2016

(Quality Systems for Automotive Suppliers)

Wafer Level Scale Packaging • ISO/TS 16949:2009

(Quality Systems for Automotive Suppliers)

100% Final IV-Testing • ISO 9001:2015

• ISO 17025:2005 (for test environment)

Batch Qualification

DCR, CTP, AP, PDE, TTDS, SPTR, Recovery, Gain

acceptance gate

Reliability Testing

H³TS: 15pcs HTS: 15pcs

MSL1: 45pcs

TC: 15pcs

IV screening of wafers

Page 35: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018 35

Visit our website and Online Shop

www.ketek.net

Page 36: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018 36

Additional Slides

Page 37: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Recovery Time and Gain

37

• illumination with a short laser pulse (70 ps pulse width)

• SiPM is driven into saturation

(Nphotons >> Ncells)

• measure signal without amplifier

• recovery time (ԏrec) via exponential fit

• gain (G) via integration of output charge

Page 38: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Probability of Correlated Pulses (PCP)

38

• DCR-setup is used

• triggered acquisition of waveforms

• determination of Δt between pulses

• build Compl. Cumulative Distr. Function (𝑃𝑡𝑜𝑡∗ )

doi:10.1109/NSSMIC.2016.8069965

• fit DCR as slowest component of 𝑃𝑡𝑜𝑡∗

determined DCR is independent of PCP

≈(1-PCP)

(1-PCP)∙exp(-DCR∙Δt)

(prob. that no event occurs at a delaytime < Δt)

Page 39: Characterization of SiPMs for Large Scale Applications...Characterization of KETEK SiPMs1 – ICASiPM 2018 SiPM Characterization of SiPMs for Large Scale Applications Eugen Engelmann

Characterization of KETEK SiPMs – ICASiPM 2018

Reliability Testing

39

Reliability Testing

H³TS: 15pcs HTS: 15pcs

MSL1: 45pcs

TC: 15pcs

Test Method Conditions Qty Target

MSL MSL classification (accord. to J-STD-020)

MSL1 45 0 failed

TC Temperature Cycling (accord. to JESD22-A104)

1000x -55°C / 125 °C 15 0 failed

H³TS High Humid. High Temp. Storage (accord. to JESD22-A101)

1000 h at 85 °C + 85 % RH 15 0 failed

HTS High Temp. Storage (accord. to JESD22-A103)

1000 h at 125 °C

15 0 failed

all test are performed without bias voltage