beamshaping for high -power lasers using freeform
TRANSCRIPT
Beamshaping for high-power lasers using freeform refractive optics
Roy McBride1, Natalia Trela, Matthew O. Currie, Duncan Walker*, Howard J. Baker
PowerPhotonic Ltd, 1 St David's Drive, St David's Business Park, Dalgety Bay, Fife KY11 9PF, UK
* Walker Optics, Edinburgh, UK
ABSTRACT
High power laser beamshapers based on lens arrays are widely used to generate square, rectangular or hexagonal flat-top
far-field beam profiles. These devices can provide high efficiency and excellent brightness preservation, but offer a limited
range of far-field profiles and can suffer from diffraction-related artefacts when used with spatially-coherent beams.
Diffractive optical elements (DOE) offer a far wider range of far-field profiles, and better speckle behavior, but bring
performance trade-offs in terms of brightness, efficiency, scattered power and residual zeroth-order power.
Freeform refractive optics offer additional choices in the design of high power laser beamshapers. Freeform lens arrays
offer a wider range of beam profile options than that available from catalogue lens array parts. Freeform field mapping
beamshapers can generate a wide range of application-specific beam profiles with high efficiency and, where required,
minimal reduction in brightness. More complex quasi-random freeform surfaces can act as a pseudorandom refractive
intensity mapping element (PRIME), providing a level of beamshaper design flexibility closer to that of DOEs, but without
the related high-order scatter and zeroth order leakage.
We describe the design and implementation of these different types of refractive beam shaper in fused silica, using
PowerPhotonic’s direct-write freeform fabrication process. This is ideal for use in high-power laser systems, where high
damage threshold and low loss are essential. We compare and contrast the performance, benefits and limitations of these
types of beamshaper, and describe how to select the ideal beamshaper type based on source coherence properties and
application beam profile requirements.
Keywords: Beam delivery, Beam shaping, High Power Laser, Optical fabrication, Micro-optics, Collimation,
1. INTRODUCTION
1.1 Beamshaping overview
High-power laser beamshaping involves converting an input beam, whose properties are generally determined by the laser
source, into a well-defined output beam, whose properties are determined by the process that the laser is being applied to.
Beamshaper design principles are well-established [1] and commercial beamshapers based on mature optical fabrication
processes are readily available [2].
Although a large range of standard beamshaping products already exists, the requirement space is even larger.
Consequently, designing a laser system based on catalogue beamshaper elements typically involves either compromising
system performance or increasing system complexity compared to what could be achieved using an optimal design.
Typical requirements driving beamshaper selection and design are:
Flexible choice of output beam profile
Insensitive to input beam
Large depth of focus
Brightness preservation
Speckle-free
Handle high peak power
High efficiency
Single, thin optical element
On-axis operation
Ease of integration into standard process head
1 [email protected] phone +44 1383 825910 fax +44 1383 825739 www.powerphotonic.com
High-Power Laser Materials Processing: Lasers, Beam Delivery, Diagnostics, and Applications III, edited by Friedhelm Dorsch, Proc. of SPIE Vol. 8963, 89630C · © 2014 SPIE
CCC code: 0277-786X/14/$18 · doi: 10.1117/12.2040660
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1.2 Standard beamshaper configuration and use
Figure 1 Generic beamshaper configuration Figure 2 Use of beamshaper in fiber-coupled process head..
The generic beamshaper configuration is shown in Figure 1. A collimated input beam passes through the beamshaper,
which modifies the far-field properties of the beam. A focusing lens is then used to image this far-field onto the process
plane. The beamshaper will usually increase the divergence of the beam. The tolerable amount of divergence increase is
a key parameter driving system design. Figure 2 shows a common requirement for beamshaper deployment: reshaping the
process-plane beam profile in a fiber-coupled process head.
The near-field distribution immediately after the beamshaper is not usually critical from an optical performance viewpoint,
though any local focusing effects must be known and controlled in order to avoid damage to nearby optics, or indeed to
avoid air breakdown when high peak power is used.
1.3 Beamshaper types
Figure 3 Beamshaper family tree
Beamshapers can be broadly categorized into two types, shown in Figure 3 Beamshaper family tree:
Field mappers, which map adjacent patches from a known input field distribution into adjacent patches in a
defined output beam profile (Figure 4(a))
Beam integrators, often known as homogenizers, which slice the input beam into a number of patches which are
then superimposed to generate the output beam profile (Figure 4(b))
Field mappers provide smooth, speckle-free output beam profiles, and can be used to generate a phase-flat (minimum
divergence) output profile when depth of focus at the process plane is critical. They are, however, highly sensitive to input
beam dimensions and profile. The beam shaper must therefore be carefully matched to the input beam, and any changes
in input beam position, beam diameter, or beam profile, will strongly affect the output beam. Field mappers typically work
best with beams of low M2.
Beamshaper Focusing lens
Collimated input beam
Process plane
Without beamshaper
With beamshaper
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Beam integrators, in contrast, are highly insensitive to changes in the input beam intensity profile, due to their
homogenizing properties. They are, however, prone to interferometric effects due to mixing these different regions of the
beam. This gives rise to strong diffraction and speckle effects when beam integrators are used with spatially-coherent
beams. Beam integrators therefore provide best performance for beams with medium to high M2.
(a) Field mapper (b) Beam integrator
Figure 4 Mapping of input beam onto output beam for the two basic beamshaper types. Input is taken to
be quasi-Gaussian (upper) and output taken to be flat-top (lower).
One consequence of this is that the most challenging regime for beamshaper design is where the input beam has low M2
but has variable properties, e.g. time-dependent variations in mode population or changes in beam profile due to operating
conditions contamination. Beam integration can compensate for these variations, but the resultant profile will inevitably
suffer from interferometric effects i.e. diffraction and speckle. These effects can be sometimes be mitigated by temporal
averaging over different mode profiles (produced e.g. by vibrating a beam delivery fiber) or by spatial averaging via the
thermal properties of the workpiece, but for individual short pulses with good spatial coherence, the effects of diffraction
or speckle are inescapable when using beam integrators.
2. FREEFORM DIRECT-WRITE OPTICAL FABRICATION
PowerPhotonic’s optical products are fabricated using a unique, laser-based freeform direct-write process. A laser material
removal process first generates a programmed net shape in the fused silica substrate material. Then a second laser-based
process locally reflows the material to remove cutting marks, resulting in an ultrasmooth, low-scatter, refractive surface.
Since no part-specific tooling or masks are required, realizing a new design of component does not incur the level of NRE
required for mask-based processing. The manufacturing process is short, so prototype parts can be generated rapidly,
cutting both lead time for custom micro-optics when compared to other free-form grayscale fabrication processes [3][4][5].
The same wafer-scale manufacturing process used make one-off prototypes is used to manufacture volume parts, so once
proven, a new design can be directly scaled up to volume manufacture.
The process is entirely freeform, with no symmetry restrictions, and is easily capable of making the complex surfaces
required by many beamshapers. Fabrication in fused silica, plus laser surface smoothing, results in parts with excellent
power handling and damage resistance properties, which are ideally suited to high-power laser applications.
3. FIELD MAPPING BEAMSHAPERS
3.1 Use of field mappers
Field mappers, commonly known as “flat-toppers”, are mainly used to transform a collimated Gaussian beam into a circular
flat-top beam. The range of beams achievable is far more general than this, however. Using a single field mapper, beams
of arbitrary radial intensity distribution 𝐼(𝑟) can be generated from a circular Gaussian beam. Further, since the radial
Gaussian function is separable in 𝑥 and 𝑦, any separable intensity distribution of the form 𝐼(𝑥, 𝑦) = 𝐼(𝑥)𝐼(𝑦) can be
generated using a field mapper.
Typically, the goal is only to generate a flat intensity profile, and the wavefront at the process plane need not be flat. A
second, phase-flattening element can be used to flatten the wavefront and hence minimize divergence of the shaped beam.
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This can be relayed to a workpiece using a 4f system in order to maximize the depth of focus of the beam at the workpiece
and keep beamshaping optics clear of spatter etc. ejected from the workpiece.
The requirement to match the field mapper to the input beam diameter is one of the factors that most strongly limits the
use of field mappers. A mismatch in beam diameter of a few percent has a significant impact on profile flatness. In order
to use a catalogue field-mapping optic, therefore, adjustable beam-expanding optics are typically required to bring the
actual source beam to the design diameter of the catalogue field-mapper. This additional complexity makes deployment
of standard field-mappers in process heads challenging, as process heads typically only have room for a simple, thin,
additional optic between the collimating and focusing lens.
Fabrication of field mappers by PowerPhotonic’s freeform direct-write process allows application-specific field mappers
to be produced economically in both low and high volumes. These application-specific optics are matched to the input
beam properties and the required output beam profile. Fine tuning of beam diameter, to optimize the match between input
beam and field mapper, can typically be achieved with fine adjustments to the existing optical system, enabling the
beamshaper to be integrated into the optical system with minimal additional effort.
3.2 Field mapper design
Field mapper design for transforming a Gaussian input beam into radial and 𝑥𝑦-separable output intensity profiles is
straightforward and well-documented [1]. For the simplest cases of circular and rectangular flat-top output, explicit
expressions for the surface profile exist. Figure 5 shows a design example. Although polynomial approximations to the
ideal surface profile have been published [6], best performance is achieved using a fully freeform description of the surface.
Design is easiest carried out in a numerical package such as matlab™. We find it good practice to also verify our design
in a standard optical design package, such as Zemax, by loading in the freeform surface as a grid sag object.
(a) Source: Gaussian intensity profile,
𝑑0 = 10mm (1/𝑒2)
(b) Radial cross-section of surface profile
(c) Zemax simulation of output:
Source M2=1
(d) Zemax simulation of output:
Source M2>>1
Figure 5 Field mapper design example: transformation of a 10mm diameter Gaussian beam
into a 10mrad flat-top far-field
-10 -5 0 5 100
20
40
60
80
100
r / mm
Sag /
m
0.0000
0.4977
0.9954
1.4930
1.9907
2.4884
2.9861
3.4838
3.9814
4.4791
4.9768
Detector Image: Incoherent Irradiance
25/11/2013Detector 6, NSCG Surface 1: CoherentSize 10.000 W X 10.000 H Millimeters, Pixels 100 W X 100 H, Total Hits = 1000000Peak Irradiance : 4.9768E+000 Watts/cm̂ 2Total Power : 9.9003E-001 Watts
0.0000
0.4667
0.9334
1.4001
1.8668
2.3336
2.8003
3.2670
3.7337
4.2004
4.6671
Detector Image: Incoherent Irradiance
25/11/2013Detector 5, NSCG Surface 1: FFSize 10.000 W X 10.000 H Millimeters, Pixels 50 W X 50 H, Total Hits = 1000000Peak Irradiance : 4.6671E+000 Watts/cm̂ 2Total Power : 9.9003E-001 Watts
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Figure 6 shows field-mapper test results for different kinds of flat-top generating element. The surface profiles of Figure
6 (c) and (d) show how the focusing lens can be integrated into the flat-top element itself, leading to a particularly simple
and practical optical system. The ability to incorporate multiple optical functions into a single, monolithic, optical element
is a key feature of PowerPhotonic’s freeform fabrication process.
(a) Gaussian source beam, 1.064µm
(b) Output beam profiles for different field mapping beam shaper designs:
circular, donut, square and rectangular flat-top
(c) Surface profile for generation of circular
flat-top, incorporating focusing lens
(d) Surface profile for generation of square
flat-top, incorporating focusing lens
Figure 6 Field mapper test results
4. BEAM INTEGRATORS
4.1 Imaging beam integrator
The imaging beam integrator, or fly’s eye homogenizer [7], divides the input beam into a regular array of
patches, and generates a set of superimposed images of each patch in the far-field. These are then imaged
onto the process plane by a focusing lens, as shown in Figure 7 (a).
This beamshaper comprises two lens arrays used in tandem, with the second array at focal length distance
from the first. The purpose of the first array is to direct all light incident on a single cell in the first array
onto the corresponding lens in the second array. The second lens images the beam profile over the cell at
infinity. This type of beamshaper is used to generate line, square, rectangular or hexagonal beam profiles.
Figure 7 (d) shows measured beam profile data for a system designed to generate a hexagonal output beam
profile.
The imaging beam integrator is typically the best choice for beams with high M2, since the output
divergence is determined by the design, not by the input beam properties. All of the input power within
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the input acceptance NA is transferred into the desired output profile, making this type of beamshaper
highly insensitive to changes in input beam divergence.
This type of beamshaper is not suited for use with high power, low M2 beams, however. The concentration
of power produced by the first lens creates a hotspot on the second lens, which can lead to laser damage.
Additionally, the periodic structure of the lens array results in 𝑥𝑦-seperable diffraction artefacts which can
easily print-through onto the process.
PowerPhotonic’s freeform direct-write fabrication process brings several specific benefits to this type of
beamshaper. By allowing free choice of lens pitch, lens focal length, and array geometry, a much greater
design space is accessible than is possible using standard parts. Also, the smooth nature of the valleys
between lenses produced by PowerPhotonic’s fabrication process means that laser power incident on the
region commonly known as the “dead zone” is largely directed into the desired output profile, avoiding
the scatter losses produced by sharper transitions.
(a) Optical arrangement (b) Solid model
(c) Surface profile: hex array (d) Test results: hex array
Figure 7 Imaging beam integrator
4.2 Convolving beam integrators
This class of designs is also known as the Diffracting Beam Integrator. We use the term “convolving” instead, for two
reasons: to avoid confusion with the specific case of the Diffractive Optical Element (DOE) and because, in many cases,
behavior is adequately described by ray optics
Convolving beam integrators have much in common with imaging beam integrators: the input beam is divided into cells,
a far-field pattern is generated for each cell, and these are superimposed in the far-field then imaged onto the process plane
by a focusing lens.
The key difference between the two types is that while the imaging beam integrator is largely insensitive to input beam
divergence, in the case of the convolving beam integrator the input divergence is essentially convolved with the point
spread function (PSF) for a single cell of the optic to generate the output intensity profile for that cell.
Consequently, convolving beam integrators should only be used when the desired output divergence is significantly larger
than the input divergence.
Due to the mixing of beams from different cells, all types of beam integrator, both convolving and imaging, suffer from
diffraction and speckle effects when used with spatially-coherent (low M2) beams.
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4.3 Single lens array homogenizer
A single array of identical lenses can be used as a convolving beam integrator, using the plane-wave-incident far-field PSF
of a single lens as the convolving term.
As for the imaging homogenizer, cylindrical and spherical lens arrays can be used to generate line, square, rectangular, or
hexagonal beam profiles. The single lens array homogenizer allows far greater design freedom than this, however, as, for
example, an array of identical axicon-type lenses can be used to generate ring patterns while groups of non-identical tilted
lenses can be used to generate other application-specific beam profiles.
In this case, PowerPhotonic’s freeform direct-write process allows not only free choice of lens pitch, lens focal length, and
array geometry, but also enables the generation of more complex beam patterns using non-spherical lens profiles, and
differing types of lens combined into in a single array.
(a) Square lens array surface profile (b) Example of hexagonal lens array
(c) Beam profile: square array,
showing source print-through
(d) Beam profile: “frame” array of
tilted lenslets
Figure 8 Single lens array homogenizer (convolving beam integrator)
4.4 Diffractive Optical Element (DOE)
The Diffractive Optical Element (DOE) is a pixelated phase grating with discrete phase steps. Binary (two-level) DOEs
are most common, though multilevel DOEs are also available.
DOEs are generally designed by Iterative Fourier Transform (IFT) techniques [8] and provide an extremely broad range
of flexibility in beamshaper design, unmatched by any other type of beamshaper. Although they inevitably suffer from
speckle when used with spatially-coherent sources, the speckle is randomized, so there is less process print-through,
particularly where thermal effects in the process can spatially average the effects of speckle.
DOEs are typically made using single or multistep photolithography combined with reactive ion etching (RIE). Multilevel
DOEs, produced by multistep processing, provide higher efficiency and fewer artefacts, but precise step transitions are
difficult to maintain over increased numbers of levels, often exacerbating problems of scatter and laser damage.
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(a) Off-axis arrangement to remove DOE zeroth order artefacts (b) Surface profile of 4-level DOE
Figure 9 DOE use in laser beamshaping
While they provide the benefit of an extremely broad design space, DOEs have some drawbacks that limit their use in high
power laser beamshaping applications:
Limited efficiency: the maximum theoretical efficiency for a binary DOE is around 80%, and fabricated optics
often exhibit substantially lower efficiency than this. Multilevel DOEs have higher efficiency, but fabrication
requirements are more challenging, and multilevel fabrication introduces other non-ideal behavior.
Scatter: the limited efficiency is a result of high levels of diffracted and scattered power. In addition to reducing
process efficiency, managing this lost power can require significant engineering effort in a high power system.
Zeroth order leakage: even with an ideal design, residual on-axis power due to imperfect fabrication would
produce a hotspot in the center of the beam for an axial beamshaper configuration, so off-axis operation (see
Figure 9 (a)) is required to avoid this. Off-axis operation prevents easy integration into standard process head
architectures, and the zeroth-order power must additionally be dissipated and removed.
Laser damage: The sharp transitions in a DOE are susceptible to laser damage at high peak power. Imperfect
transitions in multilevel DOEs can further increase damage susceptibility.
Strong wavelength dependence: the diffractive nature of these optics makes them strongly wavelength
dependent, so DOE design must be closely matched to the source wavelength.
4.5 Pseudorandom Refractive Intensity Mapping Element (PRIME)
PowerPhotonic’s freeform fabrication process is designed specifically to product smooth, refractive optics, so it avoids the
discretized phase steps and pixellation used in the DOE, which are a result of the process limitations of photolithography
using binary masks. PowerPhotonic’s process can therefore be used to realize optics designed along similar principles,
but without introducing either of these discretization steps.
The process for designing such an optical element has been described by Dixit [9]. It is essentially an IFT technique,
similar to that used to design DOEs, but without discretization of phase, and forbidding phase discontinuity and hence
phase branching. In DOEs, these allow greater design flexibility, but contribute to scatter loss. Changing from a DOE to
a PRIME approach therefore trades design flexibility for power handling capability.
PRIME design begins with a pseudorandom surface, which is iterated until it produces the required far-field profile.
Although the design process we use is based on a diffraction calculation, the resultant optic is essentially a refractive
device, mapping intensity from small cells in the input beam over the whole of the output beam. For this reason, we have
given this type of element the name PRIME = Pseudorandom Refractive Intensity Mapping Element. We use this term to
describe a continuous phase screen that is specifically designed for beamshaping.
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PRIME optics directly overcome the main deficiencies of DOEs for high-power applications. The most relevant properties
of PRIME beamshapers in this regard are:
High efficiency: no diffraction losses
Very low scatter: due to the ultrasmooth refractive surface
No zeroth order leakage: so these beamshapers can be used on axis, and integrated into standard process head
architectures
High laser damage threshold: PowerPhotonic’s fabrication process results in ultrasmooth surfaces that are
particularly resistant to laser damage, and the smooth, slowly-varying surface avoids generation of local hotspots
in the beam
Wavelength independence: these are essentially refractive optics, and the gross behavior is essentially
wavelength-independent. The exact structure of speckle will, of course, be wavelength dependent when used
with sources of high spatial coherence.
Additionally, the highly complex, smooth surface profile required for these optics is ideally suited to PowerPhotonic’s
direct-write freeform fabrication process.
Figure 10 shows a typical PRIME optic. The surface profile remains very similar to the initial pseudorandom seed surface,
which generates a Gaussian beam profile. The ITF algorithm gently nudges surface slopes until output beam profile closely
matches the target distribution. The resultant surface looks very much like security glass.
(a) Design surface profile of PRIME optic (b) Surface detail of fabricated optic
Figure 10 A typical PRIME optic
Design by IFT algorithm
Zemax simulation: singlemode
Zemax simulation: multimode
We implemented the design algorithm of Dixit [9] and used it to design two beamshapers, one generating a 10mrad full
angle square flat top, the other generating a 10mrad diameter circular flat top, as shown in the first column of Figure 11.
In order to verify our design process, we loaded our design into Zemax as a grid sag object, and modelled the behavior for
sources of high and low spatial coherence, as shown in the second and third columns of Figure 11.
We then fabricated these parts using PowerPhotonic’s’ direct-write freeform fabrication process. These parts were
manufactured using PowerPhotonic’s LightForge™ process, which is specifically designed for rapid prototyping.
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10mrad square flat-top
10mrad circular flat-top
Figure 11 Design and Zemax simulation of PRIME beamshaper optics
In order to verify correct behavior of our fabrication process, we measured the surface profile of the parts, loaded that data
into Zemax, and re-ran the simulation for the profiled surface. The results are shown in Figure 12. This confirmed that the
as-fabricated parts followed the design closely enough to generate the required flat-top profiles.
Finally, we tested the parts using the setup shown in Figure 13. The source was a fiber-coupled red diode laser, wavelength
635nm, delivered via a 1m fiber of core diameter 62.5µm and NA 0.275, resulting in a beam diameter of approximately
11mm after the collimating lens. The collimated beam passed through the beamshaper, and was then focused onto a
Spiricon beam profiler camera using a 100mm EFL lens, so that the output beam was fully contained within the camera
sensor area.
The modal properties of this source are particularly ugly, as shown in Figure 14. The output beam exhibited strong speckle,
which was very sensitive to movement of the delivery fiber. This is a typical result of launching a spatially coherent source
into an overmoded fiber.
The output beam generated by the beamshaper is shown in Figure 15. The first column shows the output beam with a
static delivery fiber. The design beam profiles are produced as intended, with a fine speckle structure superimposed, due
to the high spatial coherence of the source. A source of lower coherence (uniform mutually incoherent filling of fiber
modes) was simulated by vibrating the fiber. The result is shown in the second column of Figure 15. This shows a much
smoother output intensity profile.
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Design by IFT algorithm
Zemax simulation: singlemode
10mrad square flat-top
10mrad circular flat-top
Figure 12 Profilometer data for as-fabricated PRIME optic, and Zemax simulation for profile data
Figure 13 Test setup for PRIME optic
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Figure 14 Beam profile of PRIME fiber-coupled test source
Test results, static delivery fiber
Test results, vibrating delivery fiber
10mrad square flat-top
10mrad circular flat-top
Figure 15 Test results for PRIME optic using fiber-coupled red diode laser source
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(a) Spatially coherent source (low M2) (b) Spatially-incoherent source (high M2)
Figure 16 Simulation data for PRIME optics demonstrating design for a highly asymmetric output beam
In order to demonstrate the flexibility of the PRIME beamshaper concept, we also designed and simulated a highly
asymmetric output profile. The profile chosen was a pair of square beams of different size, spaced vertically apart. The
results of designing the required surface and simulating the output beam for sources of high and low spatial coherence is
shown in Figure 16. This demonstrates that the design process is genuinely highly flexible, and that the square and circular
beam geometries designed earlier were truly a result of design, and were not artefacts of the system geometry.
5. CONCLUSIONS
High power applications place stringent demands on laser beamshaping optics, which must provide high efficiency while
handling high peak (GW/cm2) and average (kW/cm2) power densities. Integration into standard process heads strongly
favors compact beamshaper designs, ideally single, thin, elements with smooth, low-scatter surfaces. These requirements
particularly favor the use of refractive designs fabricated in fused silica.
While there are only two fundamental types of refractive beamshaper, field mappers and beam integrators, the latter
category covers a wide range of designs and capabilities. Selection of beamshaper type is driven primarily by source
spatial coherence properties, with selection of subtype and detailed design then being driven by the precise application
requirements for output beam profile.
For spatially-coherent beams, such as low-M2 fiber lasers and DPSS, field mappers offer the best possible performance,
in terms of efficiency and output beam uniformity. Achieving this performance requires stable, well-characterized beam
properties, and a beamshaper geometry that is closely matched to the source beam width.
For beams with lower spatial coherence, a choice can be made between the different types of beam integrator.
Conventional beam integrator designs, based on microlens arrays, can provide both standard beam profiles (square,
rectangular, hexagonal) and application-specific profiles (e.g. annular) within a restricted range of beam symmetries.
In contrast, PRIME beamshapers offer a near-arbitrary choice of beam profile, while retaining the key advantage of beam
integrators: homogenization for insensitivity to input profile. These can be used to generate conventional square and
circular beams from sources of arbitrary near- and far-field profile. PRIME beamshapers can also be used to generate
highly asymmetric beams – this design approach imposes no symmetry restrictions.
Field mappers, lens-array convolving integrators and PRIME beamshapers can all be realized as a single, thin optical
element, for ease of integration into industrial laser process heads, enabling a dramatic increase in system functionality
with minimum additional engineering effort. In all three of these design types, PowerPhotonic’s freeform direct-write
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process is an ideal fabrication technology, delivering low loss fused silica optics with low scatter and high damage
threshold. A key feature of this process is the ability to make application-specific beamshapers, providing the greatest
possible design freedom, and in particular enabling prototype designs to be fabricated and evaluated without incurring
NRE costs for masks or other hard tooling. This wafer-based process provides an economic route to beamshaper
realization, from first trial parts all the way through to volume manufacture. It allows optical designers and manufacturers
of material processing system to produce application-specific beam profiles without having to make the compromises
otherwise imposed by designing with catalogue beamshaper components.
Combining high efficiency, high damage resistance, compact construction, and enabling rapid realization and evaluation
of application-specific beam profiles, PowerPhotonic’s unique fabrication capability is enabling freeform refractive optics
to become a practical, flexible and economic platform for beamshaping in high-power laser systems.
ACKNOWLEDGEMENTS
The authors thank Dilas Inc. for their kind permission to reproduce the hexagonal beam profile in Figure 7 (d).
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