auto wafer cleaning system - kedshenzhen ked optical electric technology co.,ltd. address: 3f...
TRANSCRIPT
Wafer Holder Filter
CMOS (COB&CSP)
LCD CCD
Auto Wafer Cleaning System
We Make The Difference.... Cleaning Innovation
Shenzhen KED Optical Electric Technology Co.,Ltd.Address: 3F Building 1, Huabo High-Tech Industial Park,No.7 Road, Guangqiao Road, Guangming District,Shenzhen, ChinaTel: +86-755-23429199 Fax: +86-755-23429191E-mail: [email protected]
KED Tech Pte LtdAddress: 52 Ubi Avenue 3, Frontier #02-38 Singapore 408867Tel: +6016 4748835 Fax:+65 65475451E-mail: [email protected]
Shenzhen KED Optical Electric Technology Co.,Ltd.
Address: 3F Building 1, Huabo High-Tech Industial Park,No.7 Road, Guangqiao Road, Guangming District,Shenzhen, ChinaTel: +86-755-23429199 Fax: +86-755-23429191E-mail: [email protected]
KED Tech Pte LtdAddress: 52 Ubi Avenue 3, Frontier #02-38 Singapore 408867Tel: +6016 4748835 Fax:+65 65475451E-mail: [email protected]
WPC-240Automatic Wafer Cleaning
System
Max Working Size
Max Cleaning Size
Cleaning Method
Drying Method
Rotary Range
Centrifugal Release Pressure
Max Compressed AirConsumption
Structure Material
Smallest Particle Size
Net Weight
Φ310mm
Φ300mm/310mm
Two-Fluid Cleaning DI
High-Speed Centrifugal Dewatering (Ion Wind)
0--2840 r/min
Cleaning Period:>210L/minCleaning :<210L/min
1.5-13.8Kg
SUS316 Stainless Steel
≥1um Above 98%
480Kg
DI Water Pressure >2.0Kgf
DI Water Flow SettingRange
<4L/min
DI Water Resistivity Requirements
>16MΩ
Compressed Air Pressure
0.45-0.7mpa
Clean Compressed Air Requirements
Filter 0.01um/99.5% Above Clean Compressed Air
Residual Oil<0.1ppm
Exhaust Air Consumption 3.0m³/min
Max DI Water Consumption
Cleaning Period: <3L/minCleaning :<3L/min
Operation Control
Power Supply
Machine Dimension
PLC + Touch Screen
308V 10A 50HZ
870mm(L)x1000mm(W)x1700(H)