Transparent conducting Al:ZnO thin films on large area by efficient cylindrical

rotating DC magnetron sputtering

Sanjay R. Dhage and Amol C. Badgujar

Centre for Solar Energy Materials, International Advanced Research Centre for Powder

Metallurgy and New Materials (ARCI), PO Balapur, Hyderabad 500005. India.

Supplementary Data

Figure S1. Schematic of (a) planer target and (b) Cylindrical roatating target magnetron sputtering systems

Lattice micro strain in AZO thin films is calculated based on XRD data using following equation

ϵ=βcosθ ∕ 4

Whereϵ is strain and β is FWHM while θ is Braggs angle.

Figure S2. Variation of deposition rate and strain in AZO thin films with sputtering power and power density

Figure S3. FESEM surface morphology of AZO thin films obtained for various sputter process conditions (Scale bar = 500nm)