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New J.T.Baker® photoresist stripper and residue remover can make a big difference in your game plan.

Developing a next-generation photoresist stripper and residue remover doesn’t comeeasy. It comes from a lot of hard work and a commitment to create a chemistry thatmeets the needs of technologies at or below the 90 nanometer node.

Our newest chemistry is effective for removing bulk photoresist, ash residue andanti-reflective coatings in a single step on low-κ dielectrics. It’s also 100% water soluble making it a more environmentally friendly solution.

Collaborating with our customers to solve problems is a priority for us. So whether you’re looking to improve the performance of your current process, meet environmental initiatives, or find a chemistry that’s compatible with the latest low-κdielectrics, our research and application engineers stand ready to support you.

Make our CLκ-222 photoresist stripper and residue remover part of your winning strategy today. For access to technical information, visitwww.mallbaker.com/fab or call 1-800-494-7051.

Introducing CLκ™-222 photoresist stripper and residue remover. Teaming up with customers, we created another winning solution.

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