alternative representation of qw phase accumulation model
DESCRIPTION
Alternative representation of QW Phase accumulation model. Dispersion of k(E). Synchrotron radiation photoemission spectroscopy. ISA Aarhus University Maximum Energy 580 MeV Max Current 250 mA Lifetime 15 hours. SGM1 30-400 eV 10 10 photons/sec @130 eV. Photoelectron spectroscopy. - PowerPoint PPT PresentationTRANSCRIPT
BiBr e
CiCr e
1/2
1/2
2 ( ) 2integer
3.4 1
2arcsin
B C
B
V
LC
U L
k E d nn
eVE E
E EE E
Alternative representation of QWPhase accumulation model
Dispersion of k(E)
FEVBME
5.5VE eV
2.1gV eV
1/221
2 1
2 2
1/2
22
4 ( )
2
2
2( )
G G G G VBM
G G VBM
G
r V E E V E E
r E V E E r
h GEm
m rk Eh
Synchrotron radiation photoemission spectroscopy
• ISA Aarhus University• Maximum Energy 580 MeV• Max Current 250 mA• Lifetime 15 hours
SGM130-400 eV1010 photons/sec @130 eV
Photoelectron spectroscopy• Core levels
– Chemical reactions/mixing– Growth modes
• Valence bands– Electronic levels relevant for optics
Binding Energy(eV)
sp band
h=130 eV
Secondaryelectrons
Inte
nsity
(arb
. uni
ts) Al2p
h
EF E
vac
Kinetic Energy (eV)
Scanning film thickness by movingwedge through laser or synchrotron beam
Wedge-shaped metal film
18 18 2. . mSample moved into shadow of shield. Evaporation rate ~1 ML per minute Triangular domains ~200 nm
Ag(111) LEED-pattern - only one type of domains
38,80 38,85 38,90 38,95 39,000
5
10
15
20
25Convolution fit ofGauss beamand step functiond=150 m
Si2
p pe
ak h
eigh
t (ar
b. u
nits
)
Sample position (mm)
Width of synchrotron beam
AFM
Film growth - Si2p spectra
102 101 100 99 98
0
2
4
6
8
10
101 100 99 98 97
Growth at 170 KNo annealing
130 eV
Inte
nsity
(arb
. uni
ts)
7x7
Growth at 170 KAnnealing atroom temperature
Binding Energy (eV)
0 2 4 6 8 10 120,01
0,1
1
10 Bulk 300 K Surface 300 K Bulk 170 K Surface 170 K
Inte
nsity
(ar
b. u
nits
)
Coverage (ML)
Growth at 170 K leads to exponential decay of Si2p levels with ~5Å decay rate.Room temperature annealing of the film leads to growth of large atomically flatdomains. Areas with low Ag coverage are formed.
Annealing
3,0 2,5 2,0 1,5 1,0 0,5 0,00
5
10
15
20
25
30
Double peaks
14
2418
1297
5
4210
Cu VBM
Clean Si(111)7x7
Inte
nsity
(ar
b. u
nits
)
Binding Energy (eV)
Cu buffer layerCu wedge under 10-ML Ag film
3 ML Cu: disordered film
6-7 ML Cu: optimum for Ag overlayer
> 7 ML Cu: coupling of overlayerand substrate levels -double peaks -avoided crossings
6 4 2 01
2
3
4
5
6
7
8
9
3 2 1 00,0
0,5
1,0
1,5
2,0
2,5
3,0Ag / 6 ML Cu / Si(111) Valence band 47 eV
20 ML Ag
6 ML Cu
Inte
nsity
(ar
b. u
nits
)
Binding Energy (eV)
Effect of Cu buffer layer
QW levels and film roughness
0 2 4 6 8 10 12 14 16 18 20 22 24-2.5
-2
-1.5
-1
-0.5
0
Thickness (ML)
Bin
ding
Ene
rgy
(eV
)
Film thickness variations expected within probed areaVariations within a few atomic layer give broad peaks in photoemission
Beam size on sample ~1 mm