2139-34 school on synchrotron and free-electron-laser sources...
TRANSCRIPT
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2139-34
School on Synchrotron and Free-Electron-Laser Sources and their Multidisciplinary Applications
A. Perucchi
26 April - 7 May, 2010
Sincrotrone Trieste ITALY
IR spectroscopy and microscopy in material science Electrodynamics at high pressures of strongly correlated electron systems
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IR spectroscopy and microscopy
in material scienceElectrodynamics at high pressures ofstrongly correlated electron systems
A. Perucchi
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Outline - Selected applications of IRSR in
solid state physics
• IR light and IR synchrotron radiation• Basics of IR spectroscopy in condensed matter physics
1. From Reflectivity to Optical Conductivity2. The Lorentz-Drude Model
• High-pressure measurements• Strongly Correlated Electron Systems
1. Pressure-Induced Insulator to Metal Transition in VO2
2. The complexity of V2O3
3. Pressure vs Alloying effects in NiS24. Tuning a CDW instability in RE dichalchogenides
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Electromagnetic Spectrum
FIR MIR NIR
Phonons; Drude absorption;
Gaps in superconductors;Molecular Rotations
Molecular Vibrations (“Fingerprints”);
Electronic excitations(polarons, CDW gaps,
d-bands)
Molecular Overtones andCombinations bands;
Excitons;Gaps in semiconductors
The “Terahertz gap”, Collective Excitations inMacromolecules and exotic electronic materials
IR Units: 200 cm-1=300 K= 25 meV = 50 μm = 7 THz
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Advantages of IRSR
Brightness gain
•Small samples•Extreme experimental conditions(high pressure, high magnetic field)•Spatial resolution (microscopy)
Flux gain in the THz range
• � 10 with incoherent IRSR• > 104 with coherent IRSR (CSR) lecture by S. Lupi on May 7
Pulsed structure •Time resolved spectroscopy (�10 ps)•Pump-probe
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Basics of infrared spectroscopy in
condensed matter physics
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Refractive index and Optical constants
N~
= n + ik
Complex refractive index
Real refractive index(Snell’s law, dispersion)
Extinction coefficient(absorption)
N~
= �~
(�)�1 = n2 � k 2,
�2 = 2nk
�~
= i�
4�(1��
~
)�1 =
��2
4�,
� 2 = (1��1)�
4�
Complex dielectric constant
Complex optical conductivity
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Absorbance, Optical Density and
the Lambert-Beer’s law
I0 Ik
A = �logI
I0
�
� �
�
�
Op.D.= �lnI
I0
�
� �
�
�
I = I0 exp(��d)
� =Op.D.
d = 2k�c
d
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Optical Reflectivity
R(�) =Is(�)
I0(�)
R(�) = r(�)~ 2
=(n �1)2 + k 2
(n +1)2 + k 2
2
2
From Maxwell to Fresnel equations
By normal incidence
r~
=� N
~
� N~
� N ~
+ N~
Sample
Reference (Au, Al, Ag, … )
… and at vacuum interface
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Kramers-Kronig Transformations
r~
(�) = R(�) exp i� (�)[ ] �(�) = ln r~
(�)�
� �
�
� � = ln R(�) + i (�)
� (�) = �2�
�P
ln R( � � )� � 2 �� 2 d � �
0
�
�
Following causality principle, the real and imaginary part of any linear responsefunction are univocally determined through Kramers-Kronig Transformations
To this aim one should measure R(�) over the broadest energy range:Extrapolation procedures are also used both at high and low frequencies
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The Lorentz-Drude model
d2x
dt 2 + �dx
dt+ �0
2x = �e
mEloc,
r P e = �e
r r =�(�)
r E loc,
�(�) =e2 /m
�02�� 2 � i��
r D = �
r E =
r E + 4�
r P =
r E + 4�N
r P e = (1+ 4�N�)
r E
�(�) =1+ 4�N�(�) =1+4�Ne2
m
1
(�02 �� 2) � i��
�(�) =e2 /m
�02�� 2
r D = �
rE� =
r E + 4�
rP � =
r E + 4
�(�) =1+ 4�N�� �N (�) =1+4
�(�) =1�� pD
2
� 2 + i�D�+
4�N je2
m
1
(� j2�� 2) � i� j�j
�
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Diamond Anvil Cell (DAC)
Force
Diamond
Gasket
Sample
Sample size<100 micron
T=IT / I0Op.D. = -ln(T) = �d
Rdia/sam=IR / I0
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Infrared measurements at high pressure
Transmission Measurement:Op.D= - ln (I/I0)Since I=I0 exp(-� d) one has Op.D= � dDetermination of the absorption coefficient
Reflectivity Measurement:
With nd=2.43 being the diamond refractive index
Rsd =(n + ik) � nd
(n + ik) + nd
2
Rsd =
1 measured quantity
(n ++ ik)
2 optical constantsto be determined
1 measured quantity
2 optical constantsto be determined
Infrared spectroscopy is a bulk, contactless technique which probesboth electronic and phononic excitations over a broad energy range
The full determination of the optical constants can be achieved through:• Simultaneous measurement of R and T• Lorentz-Drude fitting• Kramers-Kronig Transformations
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Electrodynamics at high pressures of
strongly correlated electron systems
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Band insulators
EF
EFEgap
Conduction band Conduction band
Valence bandValence band
Metal Insulator
The band theory is properly defined in the one-electron approximation,i.e. when W is much larger than other electronic energy scales
W >> U,e � ph
W
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Mott-Hubbard insulators
U prevents double on-site occupancy.
the opening of a gap in the
spectra of excitations is induced
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Electron-electron interaction and insulator to
metal transition (MIT)
Electronic correlation: failure of band modelHubbard model
Pressure may increase the W/U ratio inducing a MIT
W: bandwidth or kinetic energy (strongly dependent on atomic distances)
U : coulomb repulsion
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Strongly correlated electron systems
Cuprates
Manganites
FeSe
Mott insulators (V203, Bechgaard salts, NiS2)
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P-Induced Insulator to Metal Transition in
Vanadium Dioxide - VO2
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The metal-insulator transition in VO2
Insulatordimers along c
High Pressure may disentangle the two mechanismsChosen techniques: IR and Raman
so to monitor independently electronic and structural changes
Strong Interplay between electron-lattice and electron-electron interactionsDriving MIT mechanism Hubbard or Peierls?
M.M. Qazilbash et al, PRB 2007
Metal T-dependent MIT at TMIT= 340 KConcomitant lattice modification
from a low-T monoclinic (M1)phase to a high-T rutile (R) phase.
Both phases are non-magnetic
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P-dependent reflectance and transmittance of VO2
Simultaneous measurements of reflectance andtransmittance at 300 K in the M1 monoclinic
insulating phase on a thin VO2 sampleKBr pellet
VO2 slab
E. Arcangeletti et al, PRL 98, 196406 (2007)
Onset Onset of aof ametallization processmetallization process
around around 10 10 GPaGPa
Main questionMain question::is is the the metallization processmetallization processassociated to associated to a (M1-->R)a (M1-->R)
symmetry changesymmetry change??
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Optical conductivity of VO2 under high pressure
0 1500 3000 4500 60000
50
100
150
200
250
0
50
100
150
200
� (cm-1)
0.5 GPa
2.8 GPa
6.4 GPa
9,2 GPa
10.7 GPa
13.1GPa
14.4 GPa
� 1 (�
-1
cm-
1
)
0.2 GPa
4.6 GPa
5.9 GPa
10.1 GPa
11.9 GPa
12.9 GPa
13.9 GPa
0.5 GPa
14.4 GPa
11.9 GPa
13.9 GPa
10.1 GPa
� 1 (�
-1
cm-
1
)
0.2 GPa
9.2 GPa
o o o
•Different extent of Peierls distortion•Negligible effects on electronic properties at P=0
•• Structural transition Structural transition and MITand MITdecoupled decoupled at high at high pressurepressure
••Weakened relevance Weakened relevance of of PeierlsPeierlsdistortion distortion in in leading leading the MIT inthe MIT infavours favours of of electronic correlationelectronic correlation
•• Strong impact on Strong impact on theoretical modelstheoretical modelsCr=0.7% Cr=2.5%pristine
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Raman spectroscopy on VO2
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Raman spectroscopy on VO2 under high pressure
Metallization process in a new Mxmonoclinic structure
Insulator to metal transition and monoclinic to rutile transition aredecoupled at high pressure
Electron correlation is the main localizationmechanism (at least at high-P) in VO2
T
P
E. Arcangeletti et al, PRL98, 196406 (2007)C. Marini et al, PRB 2008
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The complex phase diagram of
Vanadium Sesquioxide - V2O3
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Vanadium Sesquioxide - V2O3
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Pressure vs Alloying effects in
Nickel Disulfide - NiS2
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Cubic structure
� = �0 + A �T 2
Simple cubic structureHomogeneous NiS2-xSex solution
No structural transition!Charge Transfer Insulator
Se increases bandwidth while expanding the lattice!Surprising similarities in the T-x, T-P phase diagrams
NiS2insulator
NiSe2metal
Ni pyrite and its Se alloys NiS2-xSex
S.Miyasaka et al, J. Phys. Soc. Jpn. 69, 3166 (2000)
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Coherent vs Incoherent excitations in NiS2-xSex
Mott-Hubbard
Charge Transfer
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Bandwidth vs CT controlled transition
Two different MITs:1) under pressure, W /� = const. and W /Udecreases, triggering the MIT;2) Se alloying: W /U = const. whereas W /�increases inducing the MIT;
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Tuning a CDW instability in Rare-Earth
Dichalchogenides
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Nesting wavevectors and the Peierls transition
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Hydrostatic pressure vs. chemical pressure
A. Sacchetti et al., PRL 98, 026401 (2007)
With increasing P, R(�)increases between 2000and 5000 cm-1
The same kind of behavior isobserved by applying chemicalpressure (substitution of theRare Earth ion).
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Optical conductivity
A. Sacchetti et al., PRL 98, 026401 (2007)
The optical conductivity isrecovered through a fitting ofthe reflectivity data.
It is then possible to give anestimate for the singleparticle-gap energy.
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Single-particle gap
A. Sacchetti et al., PRL 98, 026401 (2007)
V (P) = V (0) 1+B'
B0
P�
� �
�
�
�1/ B '
B(P) = B0 + B'P
� = (2� 2 /5)kB (2� � kB /hvs)3
� is known from specific heat
vs= 1923 m/s
B0 = �vs2, �=6873 kg/m3
B0 = 25 GPa
�(P)= �(0)x[V(P)/V(0)]1/3
V (P) = V (0) 1+B'
B0
P�
����
��
�
���
��
�1/ B '
B(P) = B0 + B'P
� = (2� 2 /5)kB (2� � kB /hvs)3
� is known from specific heat
vs= 1923 m/s
B0 = �vs2, �=6873 kg/m3
B0 = 25 GPa
�(P)= �(0)x[V(P)/V(0)]1/3
The high pressure measurement permits to study the evolution of the SP gap asa function of the lattice parameter by using one single sample.
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Pressure vs. Alloying
VO2Cr-doping changes structure within the insulating phase but does not affect
electronic properties. Independently on the level of Cr-doping Pressure drives ametallic monoclinic phase
V2O3Besides expanding the lattice, Cr-doping induces phase separation. Pressure drives amore homogeneous metallic phase but does not completely restore the pristine V2O3
homogeneous metallic state. Pressure vs doping scaling does not hold
NiS2Se expands the lattice contrary to Pressure
Se drives metallicity through a reduction of �: merging of Ni-eg and chalchogen pp� bandsPressure increases bandwidth of Ni-eg
CeTe3Pressure and Rare Earth substitution have the same effect on CDW:
Reduced nesting because of increased 3-D character
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References
•Review on T- and P-induced MITs on vanadium oxide compounds:Journal of Physics: Condensed Matter 21, 323202 (2009)
•VO2 and Cr-doped VO2:Phys. Rev. Lett. 98, 196406 (2007); Phys. Rev. B 77, 235111 (2008)
• T-dependence of pure V2O3 (Cr-V2O3 still unpublished):Phys. Rev. Lett. 75, 105 (1995); Phys. Rev. B 77, 113107 (2008)
•NiS2 as a function of alloying and pressurePhys. Rev. B 80, 073101 (2009)
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Acknowledgements
P. Calvani and A. Nucara,
IRS Group, University of Rome
“La Sapienza”
M. Ortolani
CNR-IFN
U. Schade
Synchrotron BESSY II Berlin
P. Postorino
HP Group, University of Rome
“La Sapienza”
L. Degiorgi
ETH Zurich
L. Malavasi
Dip. di Chimica, Università di Pavia
M. Marsi
CNRS-LPSU, France
V.A. Sidorov
Institute for High Pressure Physics
Troitsk, Moscow Region Russia
and many others…….
The SISSI@ELETTRA group
L. Baldassarre
G. Birarda
M. Kiskinova
S. Lupi
F. Piccirilli
L. Vaccari