06 mejoramiento calidad catodica planta san francisco
TRANSCRIPT
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IMPROVING CATHODE QUALITYAT HIGH CURRENT DENSITY ATSAN FRANCISCO EW PLANT
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J. Flores; K. Muoz & G. Zrate
XIII Seminario Tcnico Cytec 2010
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IMPROVING CATHODE QUALITY AT HIGH CURRENTDENSITY AT SAN FRANCISCO EW PLANT
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Julio Flores: Cathodes Plants SuperintendentKatherine Muoz: Chief Operations SX-EW
Gabriel Zrate: Metallurgist Senior Corporative
Seminario Tcnico Cytec 2010
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CONTENTS
GENERAL INFORMATIONSELE
CATHODE QUALITY
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NEW GUAR REAGENT
TESTWORK
RESULTS
CONCLUSIONS
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GENERAL INFORMATION
The plant produces about 37 Kton/year of cathode in San Francisco and
around 10 Kton/year of cathode in Los Bronces EW Plant.
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In addition, the unit is equipped with a copper sulphate pentahydrate
equivalents to 3 Kton/year of fine copper.
ROM ore is dumped with grades below the cut-off grade for the
concetrator: 0.15 0.75%Cu tot and 80% chalcopyrite (bioleaching
process)
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200 m3/h
COPPER SULPHATE
SULPHATEPLANT
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SELE (SELECTIVE ENHANCED EW)
Tecnologies developed by New Tech CopperCorporation
San Francisco Plant is the first plant that has
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mp emen e s c ean ecno ogy nnova on
Kind of basket that is introduced in the
electrolyte cell about EW process
Fiberglass Reinforced Plastic (FRP) structure
Allows electrodes to maintain a fix position,
avoiding short-circuits, that improves process
efficiency and quality
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CATHODE QUALITY BACKGROUND
Current Density (A/m2), I (A) vs Period
350
400
450
500
(A/m2)
45
50
55
60
65
10
100
150
200
250
300
2002 2003 2004 2005 2006 2007 2008 2009 2010
Curr.Den
s.
15
20
25
30
35
40 I(A)
|
Period 2002 2003 2004 2005 2006 2007 2008 2009 2010
I (A) 22,3 36,1 37,9 44,3 48,5 51,4 48,4 54,2 58,0
Curr. Dens. (A/m2) 183 296 311 363 393 406 384 430 460
Prod. (t) 11,7 16,8 21,7 27,1 30,5 34,1 33,2 36,6 2,9
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CATHODE QUALITYUP TO FEBRUARY 2010
Ao %Off grade Curr.Dens. (A/m2)
2005 19 363
2006 27 393
2007 28 406
2008 53 384
2009 60 430
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Higher %off grade is due to much higher cathode weight than required, specially
at the highest current density
Have an ambicious action plan
Improve and implement best practices operational and housekeeping EW plant
Cathode plant and Metallurgical Department, decided to test a new guar reagent
(C) in order to improve cathode quality
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Parameters to Keep Quality San Francisco Plant
Temperature of Washing Water to Cathodes [C] > 75
Temperature of Washing Water Chamber to Cathodes [C] > 70
Temperature Hot Water Tank [C] > 40
Temperature Electrolyte Income Cell [C] > 55
Poor Electrolyte Cu+2 [gpl] > 39
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Poor Electrolyte H+ [gpl] 165 to 180
pH of Washing Water Chamber to Cathodes > 6
Pressure of Washing Water Cathodes [Psi] > 80
Especific Flow Rate to Cells [m3/hr/m2] > 0.2
Weight Laminate to Harvest [Kg] 33 to 37
Frecuency to Cleaning Same Cell [month] max 12
Dosification Guar Reagent [gr/t Cu fine] > 90 % Curr.Density
Dosification Cobalt Sulphate [ppm] > 80 % Curr.Density
Poor Electrolyte Cl [ppm] 10 to 20
Poor Electrolyte Mn [ppm] max 90
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COMPARISON DIFFERENTS REAGENTS"A" "B" "C"
DESCRIPTION Guar Galactomannon PolymerDerivate
Guar Galactomannon PolymerDerivate
Low molecular weight
carbohydrate, dextrin type,
oligosaccharide group
SOLVENT Water Water Water
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WATER VOLUMEN FOR 250 GR/TON8 m
3
8 m
3 4 m3
SOLUBILITY 95% 85% 99%
DISSOLUTION T > 25C > 25 > 5C
DISSOLUTION TIME 2 hours 12 hours 0,5 hours
HIDRATATION 12 hours 12 hours Not required
AGITATION Mechanical Mechanical Mechanical or Neumatic
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"A" "B" "C"
EFFECTOS ON SX None None None
OPERATIONALS PROBLEMSLow temperatures tend to form
gel
Easy form gel to blocks pumps
and pipesNone
CATHODE DEPOSIT ESTRUCTURE Columnar Non defined Columnar
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CATHODES NODULATION Ocassional Frequent None
CATHODE LOOK Opaque Opaque Bright
ACID MIST DPRESS None None 10%
CURRENT DENSITY < 400 A/m2 < 350 A/m2 < 500 A/m2
MEASUREMENT METHOD None None Yes
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INDUSTRIAL TEST PROCEDURE (430 g/t)
First week (25%) : 4 kg C + 11 kg A (per shift)
Second week (50%) : 7.5 kg C + 7.5 kg A (per shift)
Third week 75% : 11 k C + 4 k A er shift
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Fourth week (100%) : 15 kg C + 0 kg A (per shift)
Preparation tank : C addes first with water at < 55C, agitation
for 30 min and then Guar is added
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RESULTS
Main parameters were graphed between April and June 22nd of 2010
Cathode ualit was evaluated usin S content
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Current Density vs Period
430
450
2)
17
350
370
390
Mar-10 Apr-10 May-10 May-10 Jun-10 Jul-10
Date
(Amp/
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Flow Electrolyte Feed Cells vs Period
1800
1900
2000
18
1300
1400
1500
1600
1700
Mar-10 Apr-10 May-10 May-10 Jun-10 Jul-10
Date
(m3/h)
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Copper in Electrolytes vs Period
50
55
60
l
19
20
25
30
35
40
Mar-10 Apr-10 May-10 May-10 Jun-10 Jul-10
Date
Cu+2 g
Cu Poor
Cu Rich
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Temperatures in EW Plant vs Period
70
80
90
20
30
40
50
60
Mar-10 Apr-10 May-10 May-10 Jun-10 Jul-10
Date
TC
TRich electrolyte to cells
TWashing w ater
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Average Content of Sulfur into Cathodes vs Period
30
35
40
45
)
21
0
5
10
15
2025
Mar-10 Apr-10 May-10 May-10 Jun-10 Jul-10
Date
S(pp
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Cathode Quality Distribution vs Period
60
70
80
90100
e(Sppm)
22
0
10
20
30
4050
Jan-10 Feb-10 Mar-10 Apr-10 May-10 Jun-10
Date
%Cathodegra
%Special %Total Grade A %Of f grade
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Average week S content before the test was 6.9 and 22.4 ppm and 14
ppm as median.
After test avera e S content was 2.9 and 9.3 m and 6.3 as median.
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Tendence of S content into cathode is to get values < 5 ppm
According to the graphs, current density and electrolyte flowrate
decreased after started test. They have opposite effects and overall effect
is neutralized
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CONCLUSIONS
Highest current density in copper EW plant, increase off grade quality in
cathodes and increase possibilty to have unsafe operation
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eep ng opera ona an me a urg ca parame ers, ensurance goo
quality and safety operation
Necessary have a metallurgical senior external advisor
Decision to test a new guar reagent early this year (C), is a good
complement for help to improve quality cathode, reducing S content
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In order to validate the results obtained, it has been recommended to
continue with 100% addition of C to EW plant, and follow so close sulfur
content and any effect that residual product may have on the SX plant
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Necessary test differents tecnologies to improve cathode quality
operating high current density
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Thank you!