© copyright 2002 abb. all rights reserved. - microelectromechanical systems for process analytics...
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Microelectromechanical Systems for Process AnalyticsIFPAC 2003
Dr. Berthold AndresABB Automation Products
Germany
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What are Microelectromechanical Systems (MEMS)
Why use MEMS technology for process analytical
ABB MEMS Projects
Summary
Agenda
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Microelectromechanical System (MEMS) is a miniaturization technique based upon silicon wafer technology.
This technology is a departure from the historical emphasis on the miniaturization of existing electrical, optical and mechanical assemblies
What are Microelectromechanical System?
Examples
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Why use MEMS in Process Analytical?
Size effects:
Cost of manufacturing
Cost of Installation
Analyzer Location
Sampling systems
Shelters
5 mm
Small is beautiful !!
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Manufactured in silicon wafer processes Highly reproducible Lower manufacturing cost for
larger quantities
Significantly smaller sizes Less consumables longer
time of operation Lower power demand
Portability Installation at the source
Faster response time possible Smaller dead volume Lower mass Shorter diffusion length
Designed as integrated assemblies Further reduced size
Reduced number of components
Reduced integration time
Faster cycle time
Exchangeability of complete subassemblies Maintenance is simplified
Why use MEMS in Process Analytical?
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Where to use MEMS in Process Analytical?
Two Types of MEMS Projects Analyzer Components
Moderate Risk, High Reward
Detectors, Valves, columns, ionization chambers,….
Complete MEMS Analyzers High Risk, High Reward
GC, MS, Titration,….
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1994: Our first introduction of a MEMS sensor
Designed as an integrated detector with Thin-film measuring resistor Thin-film reference resistor Membrane to control gas flow through detector Size ~ 2 sq mm Housing and electronics are added in the next step
Conventional
design
MEMS
design
100 mm 10 mm
Development of a Thermal Conductivity Detector (TCD) for gas analysis (e.g. Hydrogen in air, CO2 in air)
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Thermal Conductivity Analyzer, Summary
Development was a big success Several thousands sold since introduction
Drivers for success Size of TCD detector can be minimized without loosing
sensitivity Better technical data because of smaller size
Smaller thermal capacity of detector Faster response time
We already knew the application from our standard detectors
“Simple” design of the detector. Housing and pneumatical connections are added in another production process
Market size is just large enough for the MEMS production
Current drawback It is difficult to control the production process for small
quantities over a longer period of time (thousand is still a small number for a MEMS process)
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Realization of Micro GC with MEMS Components
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Micro-Valve Technical Specifications
Micro ball valve Electromechanically activated Ball size ~ 500 µm Plasma etching to get high precision valve seat Pressure range < 2 bar Power consumption < 300 mW
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Micro Valve Array is required for Micro-GC
Integration of multiple micro ball valves
=> Realization of dedicated flow schemes
Summary Micro ball valves can be produced
But: Production of micro ball valve arrays is very complex, overall yield is too low
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Micro Flame Ionization Detector for Micro-GC
Designed as an integrated detector silicon-glass technology integrated sample injection system integrated gold electrodes quartz capillary connectors
MEMS designConventional design
5 mm
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Flame Ionization Detector, Summary
Micro-FID has been built and is running Micro-FID shows typical problem of MEMS
technology that not everything can be simply scaled down
Quenching distance between flame and electrodes does not allow to reduce size of flame substantially
Current Micro FID has no substantial benefits compared to conventionally manufactured system
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MEMS Thermal Conductivity Detector for Micro-GC
Fast Response Time < 10 msLow Detection Limit < 10 ppm
Advantages:
• Small Thermal Capacity• Small Dead Volume
1 mm
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MEMS GC, Summary
Single components can be successfully designed
Complete GC Very complicate to go from prototypes to production
Each component must be developed and trouble shot as an individual
The integration of individual components is a second project and very complicated
GC Market Volumes are not compatible with MEMS
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Next step: Concept for Micro-Mass-Spectrometer
plasm a
acceleration grid
m assseparator
to pum p to pum p
deflectionelectrodes
to detectionelectron ics
detector
to drivingelectron ics
ionoptics
ions
e
ionizationcham ber
noblegas
m easurant
acceleration e lectrode
Target: MMS with the size of a cellular phone
Plasma Ion source
Separator with1mm length
No UHV required !
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MEMS Mass-Spectrometer, Objectives
Measuring principle or component must be scalable ok for MS
Concentrate on crucial parts of the system design where the MEMS technology can show all its advantages e.g. mass separator
Yield for MEMS processes, especially for difficult structures, is not always 100 % MEMS should be split to several components which can be tested individually
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MEMS Conclusions
ABB has been successful at targeting analyzer components for the conversion to MEMS technology
Success comes from the use of MEMS components in conventional or miniature systems
Total integrated MEMS systems may require too much time to get out of the lab and become a real product