8/3/2019 VLSI Technology Etching

1/22

/;,3.0/'$,-7.,9439.3

8/3/2019 VLSI Technology Etching

2/22

&67.3.549;.:.1.7;.449;.79.47:

%45.8

n Jfn

,n$nffnn

nnf

Jnnfn ,

8/3/2019 VLSI Technology Etching

3/22

9.3

f$ffff

,fnnfnffff

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

4/22

9.3094/8

fnffn,nf

9nffff%

nffnff%nnfn

f %ffn

fnffn

Jn nff

nf

nnfn

n ffnffff

nnffnf

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

5/22

n n% fnfnfff$

fnfnfff

n

nnff

% nfnfn

##ffn# #

#'079.,

#,907,1

:70841079

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

6/22

:70841079

nf%

n nnfn

f%n

nf

nfffnf

fnfnfffnf

(232,

232,

##

##&314729

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

7/22

nnf,ffnfnfnfff

nnnfff

fnffnnfn

nnnfnnfnffnfnnfff

nnn

fff#f

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

8/22

9.30.,3828

n nfnJn

n9nff

nfnnffnf

9ffn

fnn

nf,nfnf9%,9

#9::99.5:69;054;61:

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

9/22

099.3

Jfnfnnnnff 9nnn

f

n f

nnfn%-f

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

10/22

&67.3.549;.:.1 .7;.4

099.30.,382

fnnfff

fn fnnn

fnnfff

f&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

11/22

099.3

nfffffnfnfn

nfffnnfnfnf

ff nnffnnfn

fff n%nnnnnffnf

nff -nff

nn

nffnff

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

12/22

099.3,0308

nn

fnnn n %nff

nf

,f9n

-fnnf

fnn

ffnff

f nfffn

nfnfnf

nf&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

13/22

422430909.,398

n%%-+

-

-

9 f%nn

fn

+-f

9

f

fnnfn+9+-

f

++

+&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

14/22

422430909.,398

fnn

ffnf %-%-

%-%-

nfnnf

%fffff

fff%f%f nf

%f

+fn+nf

nnfn

nfnf

Jnfnfff#n#

+-+fnnfn

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

15/22

433

Dfnf

ffnf

nnffn

nf

n9I

fn

ff

f@nff

fff

n

ffff% @

,fnnfnf

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

16/22

ffn%f

f+

nfn f

ffff% @

9fnn

ffff

,fnnfnf

,

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

17/22

,

If n

nfn

fnf

%nnfn

Dff

n%f

9n fn

ff

%fff

fff

@nfn

fnn

n,2,08.,:80/-4323

&67.3.549;.:.1.7;.449;.79.47:

8/3/2019 VLSI Technology Etching

18/22

&67.3.549;.:.1 .7;.4

!,82,9.3

ffnfnffnffn

9fnnffffnn

fffnfn

fnnf

nnffn

n9ff

,n +&

%nf+&n

fnn

ffffn

fnnf

fff

8/3/2019 VLSI Technology Etching

19/22

&67.3.549;.:.1 .7;.4

!,82,9.3

9ffnffnff

n

fn n fn

n fnfn

W ffnf

fnffff

9ffn

9ffn

fnf

fnfnnffnf

n

8/3/2019 VLSI Technology Etching

20/22

Dffff,

ffffffnfnffffn

n fff n%

fff%

nffffIn$I

f%

f$

n

nnnnff

nffnfffn

&67.3.549;.:.1 .7;.4

!,82,9.3

8/3/2019 VLSI Technology Etching

21/22

fnffnfff%f

ffnfnf fn

nfffnffn

ff%fffnfnf

n

@fnffn fnf

nnf&&fnf+

-fnnnfn

nfnn

&67.3.549;.:.1 .7;.4

!,82,9.3

8/3/2019 VLSI Technology Etching

22/22

&67.3.549;.:.1 .7;.4