Vacuum News

and diffusion; beam-induced phase transformations-ion beam mixing, amorphisation, and crystallisation; materials modification by implantation doping-electrical, optical, tribological, characterisation and simulation and implantation equipment; ion beam synthesis by high-dose implantation; low-energy ion effects-direct or assisted thin film deposition by ion beams; physical effects-sputtering, etching, doping and damage.

This work is edited by Robert Culbertson, 0 W Holland, Kevin James and Karen Maex.

Further information from: Materials Research Society

Publications Dept 9800 McKnight Road

Pittsburgh, Pennsylvania, USA Tel 412-367-3012 Fax 412-367-4373

The American Vacuum Society has reissued three more classic books in vacuum science and technology

New York, New York-The American Vacuum Society (AVS), in co-operation with the American Institute of Physics, offers three more books in the AVS Classics Series in Vacuum Science

and Technology. This series consists of reissues of out-of- print hocks with continuing impact. The three new books now available are from 344 to 860 pp long and cost $35 each (AVS members: $28). Their titles are ionized Gases, by A. von Engel; Vacuum Sealing Techniques, by Alexander Roth; Basic Data of

Plasma Physics: The Fundamental Data on Electrical Discharges in Gases, by Sanborn C Brown. The other four titles available are Vacuum Engineering, by D J Santeler, D H Holkeboer, D W Jones and F Pagano; Field Emission and Field Ionization, by Robert Gomer; Handbook of Electron Tube and Vacuum Techniques, by Fred Rosebury; and The Physical Basis of Ultrahigh Vacuum,

by PA Redhead, J P Hobson and E V Kornelsen. Further information from:

American Vacuum Society 32nd Floor

120 Wall Street New York 10005

USA

Conference, Courses and Group Activities

The American Vacuum Society announces the call for papers for their 41st National Symposium

New York, New York-The American Vacuum Society (AVS) announces the Call for Papers for their 41st National Symposium, being held 24-28 October 1994, in Denver, Colorado, at the Colorado Convention Center. In addition to programs from the Society’s eight technical divisions and three major topical conferences, the week-long annual symposium will include over 40 short courses and an equipment exhibition with over 160 exhibitors.

Papers are being solicited as follows:

For three topical conferences: 1. NAN0 III (The Third International Conference on Nanometer-

Scale Science and Technology). 2. The Science and Technology of Manufacturing II (co-

sponsored by the IEEE).

3. Biomaterial Interfaces II (endorsed by the Society for Biomaterials).

In four focus areas (identified by the program organisers as major interdisciplinary topics):

I. Si-based optoelectronics. 2. Sensors, in situ diagnostics and process control. 3. Nanostructure fabrication and atomic-scale manipulation of

material. 4. Surface and contamination control in materials processing.

For the eight traditional technical areas of the AVS divisions: 1. Applied Surface Science. 2. Nanometer Science and Technology. 3. Surface Science. 4. Vacuum Metallurgy. 5. Electronic Materials and Processing. 6. Plasma Science and Technology. 7. Thin Films. 8. Vacuum Technology.

Further information from: Angela Mulligan

American Vacuum Society 32nd Floor,

120 Wall Street New York 10005

USA

International Field Emission Society Annual Meeting

The 42nd annual meeting of the International Field Emission Society will be held at the University of Wisconsin at Madison from 6 to 11 August 1995. This is the most widely attended meeting on field emission, ionisation, desorption and evaporation phenomena. Relevant technologies which will be covered include field ion and emission microscopy, field ionisation mass spectrometry, atom probe microanalysis, scanning tunnelling microscopy, liquid metal ion sources, vacuum microelectronics, field emitter emission sources and instrumentation. The chairman of the local organising committee is Prof Thomas F Kelly, University of Wisconsin, 1500 Johnson Drive, Madison, WI 53706, USA, (608) 263-1073. A special electronic mail address (IFES95QENGR.WISC.EDU) has been set up for conference related correspondence.

Announcements, Prizes and Awards

Tosoh SMD Scientist receives State Award of Russian Federation in Science and Technology

Eugene Ivanov, head of powder metallurgy research for Tosoh SMD, has been awarded the highest accolade from his homeland, the State Award of Russian Federation in Science and Technology. Ivanov, who has been in the US for 2 yr, received the prestigious honour for his work in the fields of mechanical alloying and mechanochemistry of oxide systems. Believed to be the only Russian expatriate to receive the award, lvanov will be returning there to accept this high honour from the President of the Russian Federation, Boris Yeltsin.

Originally known as the State Award of the USSR, the State Award of the Russian Federation in Science and Technology was established to recognise the distinguished performance of Soviet scientists. This year the award is being given in 16 different categories of science and technology.

A Doctor of Science in Physical Chemistry, lvanov received a