scanning electron microscope mirero is2003file.yizimg.com/923/2005427191976252821555.pdf ·...

Scanning Electron MicroscopeScanning Electron MicroscopeScanning Electron Microscope

MireroMirero AISAIS--21002100

February 2004

Part I. Introduction of AIS-2100 product

Scanning Electron Microscope

Mirero SystemProprietary data, Company confidential. All rights reserved

Mirero Inc.

Lens : Glass Lens : Magnetic Coil (Solenoid)

Aperture : Beam Current 조절

Scan Coil (Deflector)/ Stigmator

Filter

Sleeve : Beam Spread방지Lens 수차 발생(구면, 색 수차, Diffraction, Comma)

Detection : 시료에서 방사되는 이차전자 포집E-T Detector(별도 부착)

Vacuum : 전자 빔을 다루기 위한 진공상태유지 필요.(Chamber, Pump, Valve)

● Feature ; Nano Size Monitoring① 고 분해능(Less than 4nm)② 고 배율 ( 15X ~300,000X) -- Demagnify③ 시료표면상 관찰(Topology Inspection)④ 초점 심도가 깊다⑤ Monitoring 가능

● Feature ; Micro Size Monitoring① 거시적인 관찰(0.4um 분 해능)② 저 배율 (10X ~1,500X) -- Magnify③ Visual Inspection④ 영상처리 절차 간단하다.⑤ Monitoring 가능

Lens 수차 발생(구면, 색 수차, etc.)

a

bF

F

Z0 2F

f0

f1

Zi

Lens



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● Necessity of Nano Technology

Surface

Material

모든 산업의 Packing Density가 급격하게 증가함에 따라서 재료의 특성을 이해하는데 있어서도 미세적(Micro) 단위에서 극 미세적(Nano)인 크기의 연구가 크게 대두되었다. 예로써, 재료를 연구하는데 Bulk의 특성은 많은 연구를 통하여 물리적/화학적 특성이 알려진 반면에, 재료가Nano Scale로 초 박막(Thin Film)화 되었을 때에는 Bulk보다는 표면의특성이 매우 중요시 된다. 표면은 원자 potential이 균일하지 않고 활성화에너지가 낮으므로 외부와의 화학적 물리적 반응이 급속히 일어나는 특성이 있으므로 Bulk의 특성과는 분명히 차별화 된다. 따라서 극 미세화되고있는 산업화 요구에 관련되어 연구하는 기술이 “Nano Technology” 이다.

Surface(~nm)

Bulk (um ~)



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Adjustable Aperture

Bellows Valve

New Column DesignNew Column Design

Vacuum Display

Inner SiteVacuum Controller

Net Bias

Inner SiteVacuum System

Electronic ControllerRack Board

PersonalComputer

High VolatageTank



Mirero Inc.

● Resolution : 3.5nm● Magnification : 15 ~ 300,000X● Dual Condenser Lens

Objective Lens--1set ● Emission Current : ~ 120㎂

Emission Current GaugeFilament Current Gauge

● Beam Scan Mode :320 x 240 ≥ 12 frame/sec640 x 480 : 2.5 frame/sec1280X960 : 4 frame/min. Photo generator at 60Hzduration of frame 15 x nsec.(where n=1~99)

● Acceleration Voltage : ~30KeV● Dual Field Lens (For Aberration

Reduction)● Movable Aperture (for beam centering)● Automation Control



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-- PPM Level Voltage StabilityPPM Level Voltage Stability-- XX--ray Safety Test Confirmray Safety Test Confirm-- 고유고유 Brand HV Tank Design Brand HV Tank Design

Where, U = Acceleration Voltage

● Condition : U = 30KeV, Tungsten Hair-pin Cathode

Relative Accelerating Voltage : U* = U [1 + (eU / 2mC2)]= U(1+0.9788X 10-6 U) = 30880 V

Constant which is a function of the material : A = 60(A/cm2 K2) Where, A=60 Ew=4.5eV/K @ Tungsten / A = 40 Ew =2.4eV @ LaB6

Emission Temperature : 2700 or 3000oK Emission Current Density : j0 = AT2 e -Ew/KT

Therefore, = 1.79A/cm2, Where, K = Boltzman Constant =1.37X10 -23 J/K =8.6 X 10 -5 eV/K

Beam Brightness β = (I’ U*m2/π r2KT)=(j0 eU*) / ( π K T) = 7.5X104 A/cm2 SrEnergy Spread ΔU = T / 1160 = 2.32V



Mirero Inc.

● Customizing Manufacturing● Automation Process Control ● Flexible Tube● EDX, BSE Detector : (Option)

EDX : NORAN, RONTECHBSE : ROBINSON

● Chamber View Port :Option

● Environment : X-ray Safety● Working Distance 8nm● Multi Sample Loading Holder

● DetectorE-T Detector TypePMT Transmission > 40%Net Bias for SE CaptureSE/BSE Switching Change



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● Stage Movement Model 1.(X/Y/Z) 50 x 40 x 45 mmTilt : -30 ~90 degreeRotation : 360 degreeStage Accuracy : < ± 10㎛

Model 2. Customizing Design Support

Eucentric Tilting MechanismDesign

Motorization : 2 or 4-axis

Chamber Size : Option

☞ E-T Detector SE/BSE Selectable

☞ Stage



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● Rotary Pump, 1 set & Diffusion Pump, 1 set(TMP is available Option)

● Stable Vacuum Line,Vacuum Gauge :Computerized Control

● Automation Process Control (Safety Shut-off)

● Flexible Tube● Digital Gauge (Pirani,

Penning ; Integrated Controller) ; 상품화 준비중

ChamberChamber

Gun unit

ColumnColumn

PiraniPiraniGaugeGauge

Ionization Ionization GaugeGauge

Leak ValveLeak Valve

Receive tankReceive tank

Diffusion Diffusion PumpPump

BellowsBellows

BellowsBellows

Gate ValveGate Valve

Roughing Roughing ValveValve

ForelineForeline ValveValve

Rotary PumpRotary Pump



Mirero Inc.

S/W SpecificationS/W Specification● SEM Operation Control

Hardware ControlUser Interface Multi-Display

● Image ControlFile ManagementDiversified Auto Control

● Image AnalysisProcessingEditing/MeasurementReportingAnalysis(Includes MorphologicalAnalysis Color Segmentation and Counting.

● Net-workingIt enhances work efficiencythrough image management, analysis and evaluation.

● Client Order Base S/WEnvironmental Development(Optional)

● GAIA Link Available

3. AIS-2003 GUISCANNING

Four stepsSearch 1: 12frame/sSearch 2: 2.5 frame/sInspection; 3.6 frame/mPhoto:16.4Xn (n=1~99)

FOCUS CONTROL

F1: Ultra fine focusingF2: Fine focusingF3: Rough focusingAF: Auto focusing

DETECTOR & VIDEOControl of SE detector

synchronized with video Auto Brightness/Contrast

FILE MANAGEMENT Save/Auto saveEditingPrintNetworking to GAIA

IMAGE

Image shiftImage movement X,YImage rotationMulti displayThumbnail viewImage capture

STIGMATOR

Manual control X/YAuto stigmator

IMAGE MOVEMENT

Image movement X,YImage rotation

GAIA BLUE (Option)

NavigationObject browserThresholdFrequency filterHistogram/Profile viewBrightness/ContrastUser filter3D Data viewPseudo-coloringEdge detectionBlob analysisImage managerReport designer

AUTO CONTROLAccelerating voltageFilament heatingDetector activate

INFORMATION All SEM parameters display for operation & controlMeasurement (Length, Angle, Area)

scanning electron microscope mirero is2003file.yizimg.com/923/2005427191976252821555.pdf ·...

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