psm: phase shifted stevebrainerd1/photolithography/week 9 a · 9/11/2004 psm brainerd 1 psm: phase
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9/11/2004 PSM Brainerd 1
PSM: Phase Shifted Masks Physics Performance to date Types: Embedded Attenuated (leaky chrome) (Att-PSM): :
EAPSM Alternating aperture (Alt-PSM): AAPSM and SCAAM Unattenuated ( Chromeless): UAPSM Rim Shifters Multi-phase Low k1 PSM processes; Double exposure techniques:
IDEAL, GRATEFUL
9/11/2004 PSM Brainerd 2
PSM: Phase Shifted Maskshttp://www.kla-
tencor.com/company_info/magazine/autumn00/AutumnMag00.pdf
RET Reticle enhancement techniques by Node Embedded Attenuated (leaky chrome) (Att-PSM): : EAPSM Alternating aperture (Alt-PSM): AAPSM
9/11/2004 PSM Brainerd 3
Phase Shifted Masks: PSMhttp://www.gbhap.com/Science_Spectra/20-2-article.htm
Phase Shifted Mask IDEA 180o phase shift between spaces on mask grating ( Alt-PSM)
9/11/2004 PSM Brainerd 4
PSM: RET techniques
9/11/2004 PSM Brainerd 5
PSM: Phase Shifted Mask Basics: Physics
OPD: to create 180o phase shift at edges
Phase shift is given by: = 2t (n-1) /
n = refractive index of shifter material
= wavelength of exposure radiation
t = thickness of shifter material
180o Phase shift is given by: = = 2t (n-1) /
then shifter thickness (depth): T ()= /[2* (n-1)]
So one can tune a given material with refractive index n to be a PSM at a specific wavelength by adjusting the thickness.
9/11/2004 PSM Brainerd 6
PSM: Phase Shifted Mask Basics: UnattenuatedChromeless
180o Phase shift is given by: = = 2t(n-1)/ then shifter thickness (depth ): T ()= /[2* (n-1)]
9/11/2004 PSM Brainerd 7
PSM: Alternating Aperture Levenson idea (IBM):
9/11/2004 PSM Brainerd 8
PSM: Alternating Aperture Binary mask electric field and intensity: I = E2
9/11/2004 PSM Brainerd 9
PSM: Alternating Aperture Phase shifted mask electric field and intensity
9/11/2004 PSM Brainerd 10
Alt-PSM: Alternating Aperture
AAPSM fabrication process
9/11/2004 PSM Brainerd 11
PSM: Alternating Aperturehttp://www.advlitho.com/content/Papers/4346-72.pdf
AAPSM Issue: IntensityIntensity difference between apertures
9/11/2004 PSM Brainerd 12
PSM: Alternating Aperturehttp://www.advlitho.com/content/Papers/4346-72.pdf
AAPSM Issue: Focus issue
9/11/2004 PSM Brainerd 13
PSM: Alternating Aperturehttp://www.advlitho.com/content/Papers/4346-72.pdf
AAPSM : correction for focus and intensity issue
9/11/2004 PSM Brainerd 14
PSM: Alternating Aperturehttp://www.advlitho.com/content/Papers/4346-72.pdf
AAPSM Issue: Focus and intensity mismatch
9/11/2004 PSM Brainerd 15
PSM: Alternating Aperture AAPSM improved CD control = Aerial image intensity by
undercutting
9/11/2004 PSM Brainerd 16
PSM: AAPSM Alternating Aperturehttp://www.numeritech.com/download/files/53/ntiprsn.pdf
Alternating Aperture PSM ( hard Phase shifting): Quartz etch fabrication
9/11/2004 PSM Brainerd 17
PSM: AAPSM Alternating Aperture: undercut issuehttp://www.numeritech.com/download/files/53/ntiprsn.pdf
9/11/2004 PSM Brainerd 18
PSM: SCAAM Process http://www.ultratech.com/about/presentations/T.Ebihara.PDF
9/11/2004 PSM Brainerd 19
PSM: SCAAM Process http://www.ultratech.com/about/presentations/T.Ebihara.PDF
9/11/2004 PSM Brainerd 20
PSM: SCAAM Process http://www.ultratech.com/about/presentations/T.Ebihara.PDF
9/11/2004 PSM Brainerd 21
Att- PSM: EAPSM Embedded Attenuated Phase shift:http://www.advlitho.com/content/Papers/4000-126.pdf
Attenuated Phase shift: also called leaky chrome, weak shifter, and EAPSM( Embedded Attenuated Phase Shifted Mask): Typically MoSi2with a 6-8% transmission at a thickness that causes a 180o phase shift. Most manufacturable Phase shift mask process! Very common for contact layer!
Leaks or transmits 6% 180o phase light = weak shift at edge!
9/11/2004 PSM Brainerd 22
PSM: EAPSM Embedded Attenuated Phase shift:
Attenuated Phase shift: weak shifter, and EAPSM :MoSi2 most common
Interfernce causes cancelation= higher contrast!
Leaks or transmits 6% of 180o phase light
9/11/2004 PSM Brainerd 23
PSM: EAPSM Embedded Attenuated Phase shift:Unwanted constructive interference
EAPSM : Printing unwanted features>> Side lobe issue Unwanted constructive interference!
9/11/2004 PSM Brainerd 24
Att-PSM: EAPSM Embedded Attenuated Phase shift:http://www.ultratech.com/about/presentations/Y.Morikawa.pdf
EAPSM Future materials for Phase shift and partial transmission: Need to consider the non-zero extinction coefficient (k) slight phase impact and reflectivity!
9/11/2004 PSM Brainerd 25
PSM: Double Exposure Process
IDEAL: (Canon): Innovative Double Exposure by Advanced Lithography >. 100- 130nm gates!!
Uses 2 reticles: 1. PSM Levenson ( master can re-use) 2. Binary (custom trim) Exposure 1 using AAPSM with sub- threshold dose Exposure 2 using BIN is sub-threshold, but dose is
additive in areas of overlapping exposure(double) creating a resist pattern.
9/11/2004 PSM Brainerd 26
PSM: Double Exposure Process: Low k1 processingCanon Process Development
Dose distributions: Resist threshold 2 or greater
If Dose => 2.0 thenphotoresist reacts!!
9/11/2004 PSM Brainerd 27
PSM: Double Exposure Process: Low k1 processingCanon Process
IDEAL for logic gates
9/11/2004 PSM Brainerd 28
PSM: Double Exposure Process: Low k1 processing
9/11/2004 PSM Brainerd 29
PSM: Double Exposure Process: Low k1 processing Aerial Image simulations of Canons IDEAL T = Resist Threshold
Positive Photoresist (lines) Negative Photoresist (lines)
No exposure
Exposure ( no photoresist)
1st dose
2nd dose
Addition 1 + 2
Exposure
No exposure ( no photoresist
9/11/2004 PSM Brainerd 30
PSM: Double Exposure Process: Low k1 processing
http://www.usa.canon.com/indtech/semicondeq/news_ideal.html Aerial Image simulations of IDEAL
9/11/2004 PSM Brainerd 31
PSM: GRATEFUL Process Low k1 processinghttp://www.fsi-intl.com/products/ware.pdf
This just shows the trim exposures!
This would be the actual pattern.
9/11/2004 PSM Brainerd 32
PSM: GRATEFUL Process Low k1 processinghttp://www.fsi-intl.com/products/ware.pdf
9/11/2004 PSM Brainerd 33
PSM: GRATEFUL Process Low k1 processinghttp://www.numeritech.com/download/files/42/gratefulcomplete.pdf
Creation of PSM contacts with double exposure using negative photoresist.
9/11/2004 PSM Brainerd 34
PSM: GRATEFUL Process Low k1 processinghttp://www.numeritech.com/download/files/42/gratefulcomplete.pdf
9/11/2004 PSM Brainerd 35
PSM: GRATEFUL Process Low k1 processing100nm Node Lithography with KrF?? Paper:
M.Fritze etal. MIT
9/11/2004 PSM Brainerd 36
PSM: GRATEFUL Process Low k1 processing100nm Node Lithography with KrF?? Paper:
M.Fritze etal. MIT
9/11/2004 PSM Brainerd 37
PSM: GRATEFUL Process Low k1 processing100nm Node Lithography with KrF?? Paper:
M.Fritze etal. MIT
PSM: Phase Shifted MasksPSM: Phase Shifted Maskshttp://www.kla-tencor.com/company_info/magazine/autumn00/AutumnMag00.pdfPhase Shifted Masks: PSMhttp://www.gbhap.com/Science_Spectra/20-2-article.htmPSM:PSM: Phase Shifted Mask Basics: PhysicsPSM: Phase Shifted Mask Basics: UnattenuatedChromelessPSM: Alternating AperturePSM: Alternating AperturePSM: Alternating ApertureAlt-PSM: Alternating AperturePSM: Alternating Aperturehttp://www.advlitho.com/content/Papers/4346-72.pdfPSM: Alternating Aperturehttp://www.advlitho.com/content/Papers/4346-72.pdfPSM: Alternating Aperturehttp://www.advlitho.com/content/Papers/4346-72.pdfPSM: Alternating Aperturehttp://www.advlitho.com/content/Papers/4346-72.pdfPSM: Alternating AperturePSM: AAPSM Alternating Aperturehttp://www.numeritech.com/download/files/53/ntiprsn.pdfPSM: AAPSM Alternating Aperture: undercut issuehttp://www.numeritech.com/download/files/53/ntiprsn.pdfPSM: SCAAM Process http://www.ultratech.com/about/presentations/T.Ebihara.PDFPSM: SCAAM Process http://www.ultratech.com/about/presentations/T.Ebihara.PDFPSM: SCAAM Process http://www.ultratech.com/about/presentations/T.Ebihara.PDFAtt- PSM: EAPSM Embedded Attenuated Phase shift:http://www.advlitho.com/content/Papers/4000-126.pdfPSM: EAPSM Embedded Attenuated Phase shift:PSM: EAPSM Embedded Attenuated Phase shift:Unwanted constructive interferenceAtt-PSM: EAPSM Embedded Attenuated Phase shift:http://www.ultratech.com/about/presentations/Y.Morikawa.pdfPSM: Double Exposure ProcessPSM: Double Exposure Process: Low k1 processingCanon Process DevelopmentPSM: Double Exposure Process: Low k1 processing Canon ProcessPSM: Double Exposure Process: Low k1 processingPSM: Double Exposure Process: Low k1 processingPSM: Double Exposure Process: Low k1 processing http://www.usa.canon.com/indtech/semicondeq/news_ideal.htmlPSM: GRATEFUL Process Low k1 processing http://www.fsi-intl.com/products/ware.pdfPSM: GRATEFUL Process Low k1 processing http://www.fsi-intl.com/products/ware.pdfPSM: GRATEFUL Process Low k1 processing http://www.numerit
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