Photo-Lithography Photo-Lithography

John GlenningJohn GlenningSeptember, 2013September, 2013

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyPhotolithography: The process of transferring geometric shapes on a mask to a surface

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyPhotolithography: The process of transferring geometric shapes on a mask to a surface

Light is used to transfer a pattern from a photo-mask to a light sensitive chemical commonly referred as a photoresist.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyPhotolithography: The process of transferring geometric shapes on a mask to a surface

Light is used to transfer a pattern from a photo-mask to a light sensitive chemical commonly referred as a photoresist.

The process is done in a “cleanroom” because particulate contamination can cause voids to be created in the material. This is dependent on the size of the particle and thickness that is being etched.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyPhotolithography: The process of transferring geometric shapes on a mask to a surface

Light is used to transfer a pattern from a photo-mask to a light sensitive chemical commonly referred as a photoresist.

The process is done in a “cleanroom” because particulate contamination can cause voids to be created in the material. This is dependent on the size of the particle and thickness that is being etched.

This process is followed by an etching process or a deposition process.  

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyPhotolithography: The process of transferring geometric shapes on a mask to a surface

Light is used to transfer a pattern from a photo-mask to a light sensitive chemical commonly referred as a photoresist.

The process is done in a “cleanroom” because particulate contamination can cause voids to be created in the material. This is dependent on the size of the particle and thickness that is being etched.

This process is followed by an etching process or a deposition process.  

A photoresist is exposed to light by projection through a glass that has geometric patterns.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyPhotolithography: The process of transferring geometric shapes on a mask to a surface

Light is used to transfer a pattern from a photo-mask to a light sensitive chemical commonly referred as a photoresist.

The process is done in a “cleanroom” because particulate contamination can cause voids to be created in the material. This is dependent on the size of the particle and thickness that is being etched.

This process is followed by an etching process or a deposition process.  

A photoresist is exposed to light by projection through a glass that has geometric patterns.

This often followed by photoresist developing, etching, photoresist stripping and cleaning.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyPhotolithography: The process of transferring geometric shapes on a mask to a surface

Light is used to transfer a pattern from a photo-mask to a light sensitive chemical commonly referred as a photoresist.

The process is done in a “cleanroom” because particulate contamination can cause voids to be created in the material. This is dependent on the size of the particle and thickness that is being etched.

This process is followed by an etching process or a deposition process.  

A photoresist is exposed to light by projection through a glass that has geometric patterns.

This often followed by photoresist developing, etching, photoresist stripping and cleaning.

The process requires a flat substrate. © 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyCleanrooms:

An environment that has a low level of air-borne contaminants such as dust, bacteria and chemical vapors.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyCleanrooms:

An environment that has a low level of air-borne contaminants such as dust, bacteria and chemical vapors.

A cleanroom has a controlled level of contamination that is specified by the number of particles per cubic meter at a specified particle size

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyCleanrooms:

An environment that has a low level of air-borne contaminants such as dust, bacteria and chemical vapors.

A cleanroom has a controlled level of contamination that is specified by the number of particles per cubic meter at a specified particle size

These particles can create voids in the material when they deposit on the artwork.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyArtwork:

The “artwork”, also known as a mask, needs to be created.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyArtwork:

The “artwork”, also known as a mask, needs to be created.

The artwork is created on glass that has an acceptably low coefficient of thermal expansion.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyArtwork:

The “artwork”, also known as a mask, needs to be created.

The artwork is created on glass that has an acceptably low coefficient of thermal expansion.

Every product design has to have different artwork.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyArtwork:

The “artwork”, also known as a mask, needs to be created.

The artwork is created on glass that has an acceptably low coefficient of thermal expansion.

Every product design has to have different artwork.

Most products have artwork for the front and back of the product to be etched

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyArtwork:

The “artwork”, also known as a mask, needs to be created.

The artwork is created on glass that has an acceptably low coefficient of thermal expansion.

Every product design has to have different artwork.

Most products have artwork for the front and back of the product to be etched

Artwork is created by sputtering metal on glass, imaged using a photoresist and the metal is removed (etched) from the area where the light needs to transmit through.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyArtwork:

The “artwork”, also known as a mask, needs to be created.

The artwork is created on glass that has an acceptably low coefficient of thermal expansion.

Every product design has to have different artwork.

Most products have artwork for the front and back of the product to be etched

Artwork is created by sputtering metal on glass, imaged using a photoresist and the metal is removed (etched) from the area where the light needs to transmit through.

If the wrong type of glass is used, the image can “walk” while the glass heats up.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyProduct Manufacturing:

The surface of the material is cleaned using clean water and filtered to remove particulate contamination.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyProduct Manufacturing:

The surface of the material is cleaned using clean water and filtered to remove particulate contamination.

The surface is dried.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyProduct Manufacturing:

The surface of the material is cleaned using clean water and filtered to remove particulate contamination.

The surface is dried.

A photoresist is coated, usually on both sides

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyProduct Manufacturing:

The surface of the material is cleaned using clean water and filtered to remove particulate contamination.

The surface is dried.

A photoresist is coated, usually on both sides

The front and back images need to be properly aligned with in the acceptable tolerances in the X, Y and Ɵ directions.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyProduct Manufacturing:

The surface of the material is cleaned using clean water and filtered to remove particulate contamination.

The surface is dried.

A photoresist is coated, usually on both sides

The front and back images need to be properly aligned with in the acceptable tolerances in the X, Y and Ɵ directions.

Light is then projected onto the photoresist for a sufficient period of time to cross-link the areas where it is desirable to prevent etching.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-LithographyProduct Manufacturing:

The surface of the material is cleaned using clean water and filtered to remove particulate contamination.

The surface is dried.

A photoresist is coated, usually on both sides

The front and back images need to be properly aligned with in the acceptable tolerances in the X, Y and Ɵ directions.

Light is then projected onto the photoresist for a sufficient period of time to cross-link the areas where it is desirable to prevent etching.

The material is etched, the remaining photoresist is “stripped” off and the surface is then cleaned.

© 2013 John Glenning© 2013 John Glenning

Photo-LithographyPhoto-Lithography

End of Presentation

© 2013 John Glenning© 2013 John Glenning