automated layout and phase assignment for dark field psm
DESCRIPTION
Automated Layout and Phase Assignment for Dark Field PSM. Andrew B. Kahng, Huijuan Wang, Alex Zelikovsky UCLA Computer Science Department http://vlsicad.cs.ucla.edu Supported by a grant from Cadence Design Systems, Inc. Outline. Phase assignment for dark field Alt PSM - PowerPoint PPT PresentationTRANSCRIPT
Automated Layout and Phase Assignment for Dark Field PSM
Andrew B. Kahng, Huijuan Wang, Alex Zelikovsky
UCLA Computer Science Department
http://vlsicad.cs.ucla.edu
Supported by a grant from Cadence Design Systems, Inc.
Outline
• Phase assignment for dark field Alt PSM
• Removing odd cycles from conflict graph – previous work– proposed methods
• Algorithms for odd cycle elimination
• Implementation experience
• Conclusions
Outline
• Phase assignment for dark field Alt PSM
• Removing odd cycles from conflict graph – previous work– proposed methods
• Algorithms for odd cycle elimination
• Implementation experience
• Conclusions
Alternating PSM
conventional maskglass
Chrome
phase shifting mask
Phase shifter
0 E at mask 0
0 E at wafer 0
0 I at wafer 0
Phase Assignment Problem
Features Conflict areas (<B)
0 0180
< B > B
Assign phases 0, 180 to all features s.t. pairs
with separation < B have opposite phases
b minimum separation
B minimum separation between same-phase features
b
Conflict Graph
< B
Vertices: features
Edges: conflicts
(feature pairs with separation < B )
Odd Cycles in Conflict Graph
No valid phase assignment exists, because of odd cycle (triangle) in conflict graph
Valid assignment 2-colorable bipartite no odd cycles
Breaking an Odd Cycle
B
Outline
• Phase assignment for dark field Alt PSM
• Removing odd cycles from conflict graph – previous work– proposed methods
• Algorithms for odd cycle elimination
• Implementation experience
• Conclusions
Previous Work
• Interactive methods (Ooi et al., Moniwa et al.)– detect odd cycles – manually widen spacing for chosen pairs
• Compaction method (Ooi et al.)– symbolic layout from mask layout– phase assignment in symbolic layout – PSM design rules– compaction of symbolic layout
Proposed Methods
• Iterative coloring and compaction
• One-shot phase assignment
• Conflict edge weight
• Splitting of features
• Vertical/horizontal spacing
• Layer assignment
Iterative Phase Assignment and Compaction
Iterate until conflict graph becomes bipartite:
• Compact the layout and find conflict graph
• Find minimum set of edges to be deleted
from conflict graph for 2-colorability
• Add new separation constraints: one per
deleted edge
Iterative Phase Assignment and Compaction
find minimum # edges to be deleted
for 2-colorobility
conflict graph
already 2-colorable
PSM constraints
compaction
phase assignment
no
yes
One-Shot Phase Assignment
• Find conflict graph • Find minimum set of edges to be deleted
from conflict graph for 2-colorability • Assign phases such that only chosen
conflict edges connect features of the same phase
• Compact layout with PSM design rules:– B-separation if features have the same phase– b-separation if features have different phase
One-Shot Phase Assignment
conflict graph
compaction
phase assignment
find minimum # edges to be deleted
for 2-colorobility
Conflict Edge Weight• Compaction moves all features left• Constraint graph contains arcs between edges• Critical path between leftmost, rightmost features• Conflict edges not on critical path: break for free
critical path
Feature Splitting
• Splitting features may eliminate odd cycle • Green areas: phase shift between 0, 180
degrees
Vertical / Horizontal Spacing
• Introducing a vertical or horizontal gap eliminates all conflict edges that cross gap
• Optimal algorithm to find min # gaps
Layer Assignment
Outline
• Phase assignment for dark field Alt PSM • Removing odd cycles from conflict graph
– previous work– proposed methods
• Algorithms for odd cycle elimination• Implementation experience • Conclusions
Optimal Odd Cycle Elimination
• Construct conflict graph G
• Construct dual graph D
• Find odd-degree vertices ODD in D
• Find minimum weighted perfect matching of ODD (weights = the length of path)
• Delete all edges of G which correspond to paths of the minimum matching of ODD
Optimal Odd Cycle Elimination
conflict graph
dual graphmatching of odd degree nodes
blue features/red conflicts
Optimal Odd Cycle Elimination
conflict graphmatching of odd degree nodes
delete green conflictsblue features/red conflicts
Fast Algorithm• For each odd degree vertex V in dual graph
– Voronoi region even degree vertices which are closer to V than to any other odd degree vertex
• Connect two vertices if there is an edge between their Voronoi regions– edge weight path cost in dual graph
• Find matching between odd degree nodes in Voronoi graph
3
Outline
• Phase assignment for dark field alt PSM • Removing odd cycles from conflict graph
– previous work– proposed methods
• Algorithms algorithm for odd cycle elimination
• Implementation experience • Conclusions
Compaction
• Shape constraints
• Connectivity constraints
• Spacing constraints (PSM design rules)
• Bellman-Ford solution for constraint graph for one-dimensional constraint graph in x-direction
• Flip design and solve in y-direction
Data Flow
• GDSII CIF
• CIF internal layout representation
• New layer with phase shift CIF
Results
TEST Layout1 Layout2 Layout3
# polygons 3769 6914 36227
# rectangles 4549 8691 36227
Conflict graph runtime 1.88 1.40 19.99
Dual graph runtime 4.45 0.23 42.63
Voronoi graph runtime 0.06 0 0.18
Matching runtime 1.1 0.26 5.96
# critical conflicts 1402 0 5672
Outline
• Phase assignment for dark field alt PSM • Removing odd cycles from conflict graph
– previous work– proposed methods
• Algorithms algorithm for odd cycle elimination
• Implementation experience • Conclusions
Conclusions