a micromachined silicon magnetometer
TRANSCRIPT
ELSEVIER
Abstruet
SCtl'Ol' ,lIlll Atluator" A 61 ( J9(7) J39-J..t I
A micromachined silicon magnetometer
F. Ayela *, T. Fournier, 1. ChaussyC('IIf/I!(/e R/!l-Il/!rcllt.' \/11 I/!\ "lre\ J!(III/.',\ T('IIIJIf!lCltllrtJ~. CNRS. BP 1M, F·3{I)0.J2 GIf.'lloble CC'(!t'l 9, Fnmel'
seNSORsACTUAfORS
APHYSICAL.
A nowl magnetic !lem.or I~ under invc\tigation. Tlth devIce h a bldll1lcl1~lOnal genclall/ntion of vibrnling reed magnetometers, and b.intended to be~ell!'lltlve to very low magnetic lield!oo (abouIIO- 'IT Hz- 1/2) and to very low magnetic moment!oo. Thi!< !lcl1!loru'\c\the magneticforce which acl!l on a sample of tolal llmgnclwluon M \ubmittcd to a magnetic field grulllcnt gr~ld8. The dcformmioll caused by the lorceapplied to a Ihm Mlicon mClllbnmc can be cap:tcllively detected. Whclllhc lield gradient IS 'Ul alternatlng olle 'It the rc!\onJnce frequency ofthe membrane, the deformation 1\ enhallced by (he Q-f:'lctor. With \uch adeVice, one could perform mugnetlc mCU"lirement~ with ull\urpa~~ed
\ell!tilJVIUe~ over aWide range ortemperaturc. An experlmcntal !\ct-up to perform Qmca\urClI1cnt\ 011 Si mCl11bmnc~ !tubmj(tcd to an allernatlngelectro!tt311C force 1\ uho dC!\CI Ibed
K('\,II(}/(I\. Magncllc \cn"or\. SilIcon IllCmhr,llle\. Eleclro\WIIC lor~'c Q-fac(or"
(I)
1. Introduction
The most sensitive magnelic devices are up to now quantum interferometers whose superconductlllg properties Implythe use of a cryoge",c infrastructure. We urc eluborating asensor which can act over a Wide range of temperature,because it IS bu,ed on the mugnetic force which derives from'he magnctic potential E= -MH, where M is the magneticmoment of a sample or of a thin liIm under investigatIOn.When this sample is submitted to an alternating magneticfield gradient, the magnetic force will move it periodIcally.This method has ulready been used wllh cantilevers [1-31.We wunt to upply Il to a thin nllcromachined siliconmembrane, in order to measure capacillvely the magnetizatIOn vru the thin membrane deformation, and to increase thesensitivity. We present the sensor concept. an estimation ofthe sensitiVIty and an expelimentul set-up built to mea,urethe Q-factor of silicon diuphragms.
2. Sensor concept
The magnelic force is a consequence of the pocentialE= - MB. When M is ,patially umfonn. the resulting forceF, ulong the direction: IS
uB, aB, uB,F,=M' a: +M,·u: +M'ilz
'" ConC\pOndlOg author, Tel.. +33476889071 F.II(.· +33476885060
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M" M, and M, urc the components of the magnetic momentM under invcstigation. uBla: b a magnetic field g-adientcontrolled by the u,er. C1u"ical values of uBli!: range from0.5 to 5 T m-1 II]. An alternating field gradient gives wayto an ulternating force. Fig. I shows the sen'or concept. Thesample is fixed on thc silicon membmnc in front of a fixedelectrode plute. mordcno produce uvariable capucitor [4,5].Coils produce an alternullng magnetIc field gradient A correct orientatIon 01 the'e coils may select un uppropriate component of dlJlul, und so the rcsulting force F, is proportionalto M" M, or M,. It is obvious that thc frequency ofaBla: husto bc sct to Ihe mechanicu' resonance frequency of the Si
I Sisubslralc2 SI dIaphragm3GIJsselcclrOde4 Sample of magnetic momenll\t5 MagnctlccOlI~
.. Melalhzcdarcas
fig. I Schcm.llh: concept of the magncllc \Cll\Or.
.140 F. Aye/a t!t (II. /St!I/f(}I~ lim! Al.tJlator.!J A(j/ (/997J 339-34/
3. Qmeasurements
membrane with the sample. The maximum deflection of themembrane is
where G is the total gain ofamplification. Afrequency sweepallows the resonance frequency to be determined and C to bemeasured.
(6)
(8)
Biasing the capacitor with Ii V= V+vcoswt, where V» ",gives rise to an electrostatic fOlce F= Fo+FJe1ldf +F2e12
/JJt,
where Fu=Fo(V'), F,=F,(V,,), F,=F,(v'). One hasF,« F, «Fo. As a consequence, the 5i diaphragm will onaverage move as
z(t) =zo+z,exp[j(wl+c/>I») +z,exp[j(2wl+q,2)] (5)
The current flowing through the capacitor and the loadresistance of the field-effect transistor assuming the first stageof amplification is
i=C~1i V+!iV~dt dl
because C is a function of time.When the excitation is made at the resonance frequency
w= wo, z, is amplified by Q, and cjJl = -1T12. The capacitance is
C",C*(1 + ~;r sin wut+~ cos 2wut-(Q;')' sin'w"t) (7)
with C· = foilld, as long as Q<I «d and z, «d.One finds:
i= woC*( vaf, cos w"t-" sin WoI+"af, cos 2wut
-2vaf, sin 2Wot}
where the relative variations aft and af, are
aft =Qz,d
af,=~+~(QZJ)' ",~(Qz,)'-d2d 2d
The analysis of the in-phase term in coswol allows us tod~termine the Q-value. The amplitude z, is a fU'lction of F,which varies as Vv, so that i(cosWot} = wuC*V must vary asV' for a fixed value of v af, is varying as V',,', so that thequadratic term in sin2wol must be a function of V'v'.
For all the tesled diaphragms, a frequency sweep performed under a primary vacuum of 0.3 torr has shown thatthe mechanical resonance frequency is in the audio frequencyrange ( '" 8-10 kHz). The evolution oftlte ullJphfied voltageat Wo allowed the Q-value to be determined. Recent resultsarc reported in Fig. 3. This is the evolutIOn ofthe input voltageV,,(wo) =Ri(wo) as a function of V'. The hnear aspect ofthe plots is well established. The dete'mined Q-valueobtained from the experimental data is around 300. Probablythis low value is caused by the poor vacuun,le,el [6]. Theevoluti'ol1 of the quadratic term at 2wo is plotted in Fig. 4 asa function of V',,'. The linear variation confirms that theabove calculation and the experimental Q-vnlue agree Withthe one found before.
The principle of Q measurement now being well established, the experimental set-up is being enhanced to reach a
4. Future prospects
(2)
(3)
(4)
IiC QAF.
c= 16EN
Relative changes IiclC of 10-7 can be easily detected.With classical values such as Q= 5000, A=5 mm', E= 10"N m-', 1=3 f1m and d= 10 f1m, one can detect a value ofF,'" 10-1S N, corresponding to 10- 12 emu OrlO about 10-14T with perfect diam,lgnetism of a superconducting thin film.
H(w)=jGRCw
where E is the Young modulus of silicon, Q, A and I are thequality factor, the area and the thickness of the dltlphragm,respectively. It can easily bc shown that the capacitance ofsuch a system is C=foil/(d-z) where d is the distancebetween the two electrodes of the capacitor and z= z,,/3.
The relative variation of C is
Various silicon diaphragms with relatively large areas( '" 0.5 cm X 0.5 cm) have been made following classicaletching techniques. Their thickness runs from 2 to 8 f1m. Anapproximatly 1000 Athick gold or niobium layer was sputtered onto the 5i diaphragms to ensure the electrical conductivity ofthe moving electrode. Recesses were etched in piecesof Pyrex and metallized to form an air gap ( '" IS f1m) ?udone of the capacitor pl?tes. The capacitance of such devicesIS about a few picofarad.
We have used the electrical set-up shown in Fig. 2 to studythe d)namic properties of the 5i diaphragms. An alternatingvoltage /lcoswl is applied to an RC series circuit where C isthe capacitance of the sensor and R the load resistance at theinput of the field-effect transistor. The transfer functionH(w) =GV"lv is
Fig 2. Electronic deSign lonpply an electrostatic force onto the Si diaphragm.The 100 nF capacitor and the 10 Mil re~lstor have to prevent the electromccirCUitry from any dnmage caused by the high contmuou.. voltage V. whenthe 51 electrode louche:. the other electrode of the capJcitor C.
F. Aw!la et al /Sell.lor~ wul AclIllIton A 61 (1997) 331)-34/ 341
160- • -v,,'O,5V.. 0-. v",:lV
0- vO#'2V
tion, These preliminary steps are preceding the magneticsensor realization itself.
Rderenccs
40
.0
~---~-~-~-~-:~-~-~:--- ~OL.....~--'-~.........~~--"-'~.-1..~---.J
o 2000 4000 6000 8000 10000V 'tV')
Fig. 3. MiI ..illlUlll mea~ured voltage V,: lllea"ureu at the rc'\onanee Ircqucncyu" a functioll f)f V2• for diffcrent .llternllting voltage" I' A\ predicted, theevolution i" linear und allow'\ the Q-value of tile re"onatorlo he dctcrmined
100
( ro=tOOo
)
10:;- .,.:; •,5> •.,
•.'
0.110' 10' 10' 107
v.',V: (Vs)Fig 4, M.lxlmum vollJgc V,n mea"ured at 2~). •1\ II function of V ll'~ ThiSplololgree'\ wIth the expected evolulloll. and 1\ another WolY to determme theQ-valu~ of the dillphragm.
vacuum better than 10-' tOIT. Sr,veral SI membranes withdifferent types of vibratmg mode:; are now under investiga-
1r I W. Rom. KA Hempel. C. Voigt. H Dedench" .md R Schipper. High!'len~ltlvlly vlbratmg reed magnetometer, Rei'. Sci.III.~lrlllll" 51 (1980)612-613.
[21 H. ZijI"tr,l. A vlbr.llln£ reed magnetometer for mlcrm.coplc partlc!e:-.,Rei'. Su Imlmll/,,4/ (1970) 1241-1243.
13 J PJ, Flanden.. An ultemuting-grudlent mllgnetometel.J Appl. Plnf .63(1988) 3940-3945,
[41 P. Roth ilnd E, Gmelin. A colpacitanc.e dh.placement 'oen'oor with cl.l"ticl.haphragm. Rei'. SCI, Imlrlllll" 63 (1992) 2051-2053.
[51 PG Dolrgie ,1111.1 S,T. Hughc". A thick· film C.lpJClllVI; differentialpre\'iure tran\duccr.Mc(j\ SCI. Tee/mol. 5 (1994) 1216-1220.
[61 JC. Greenwood, Etched \dlCOn vibr.lting :-,cl1\or.J, p".l'f E.17 (19K4)650-652
Iliographics
Frederic Aye/a received a Ph.D. degree In solid-state physics from the Universil" Joseph Fourier de Grenoble in 1993.He became an assistant profes<OI at this univerSIty in thesame year and is working on solid-state physics experiments.
711ierry Fomllier is a research engineer. He received aDoctorate ofPhysics from the Institut National Polytechniquede Grenoble in 1986. Since 1988, he has worked for theCentre National de la Recherche Scientifique,
Jacques Clwus.\y is a re~earch director at the CentreNational de la Recherche SClentifique, HIS research team setup very sensitive devices in order to perform fundamentalphysics experiml'nt' at very low temperatures,