Vacuum/volume 33/number 4ipsge 205/l 993 Printed in Great Britain

Pergamon Press Ltd

6th Congress of the Israeli Society for Vacuum Technology

Introduction

The Sixth (hqrcss of the IsracU Society for Vacuum Tcclmology was held at the Tachnion-Israel Institute of Technology, Haifa on 4-5 April 1982 The talks presented included a variety of aspects on the application of vacuum technology, which rafkct the research and development activities in this country. A total of nine invitcd_takg including speakers from England and Holland and 35 contributed papers wcrc presented. The British Council provided support for some invited speakers.

The rubjccts dealt with induded mass spactrometxy, cktric vacuum ucs, vacuum metallurgy, ion implantation treatment of metal surfs quantitative analysif of surfaces by samdary ion mass spactrometry, photo&ctron spcctroacopy of solid surfaces. diffusion at solid interfaces,

prcparatioo of thin 6lms by sputtering, ektron bombardment, chemical vapour deposition, cold plasma and other tahniquca; optical, electrical and electronic properties of thin 6lms.

ApartoftheseNbjCdl)Wtrepnemttdinr~ressionorganizadby the Division of T’hin Films and Solid Surfaces, which is jointly sponsored by the Israel Phytical society and the Israeli Society for Vacuum Technology, and holds annual meetings. Visits to the Ion Implantation Laboratory and the Surface Science Laboratory of the Solid-State Institute, Tachnion, were a part of the congress programme.

A wktcd number of 13 papers, an extendad abstract and abstracts of the rcmaing papers are presented in this proceedings.

Resident, Israeli Society for Vacuum Technology

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